Nonvolatile semiconductor memory, fabrication method for the same, semiconductor integrated circuits and systems

ABSTRACT

A nonvolatile semiconductor memory which is configured to include a plurality of word lines disposed in a row direction; a plurality of bit lines disposed in a column direction perpendicular to the word lines; memory cell transistors having a charge storage layer, provided in the column direction and an electronic storage condition of the memory cell transistor configured to be controlled by one of the plurality of the word lines connected to the memory cell; a plurality of first select transistors, each including a gate electrode, selecting the memory cell transistors provided in the column direction, arranged in the column direction and adjacent to the memory cell transistors at a first end of the memory cell transistors; and a first select gate line connected to each of the gate electrodes of the first select transistors.

CROSS REFERENCE TO RELATED APPLICATIONS

This application is based upon and claims the benefit of prior JapanesePatent Applications P2003-28413 filed on Feb. 5, 2003 and P2001-238674filed on Aug. 7, 2001; the entire contents of which are incorporated byreference herein.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to a semiconductor memory device. Inparticular, the invention relates to a minute nonvolatile semiconductormemory device, fabrication method for the same, semiconductor integratedcircuits and systems which include a memory cell unit (NAND cell) thatis configured with a plurality of memory cells connected to each other,and select transistors doped with impurities in their respective channelregions.

2. Description of the Related Art

Conventionally, for example, an electrically erasable programmableread-only memory (EEPROM), which electrically writes and erases data, isknown as a nonvolatile semiconductor memory device. In the EEPROM, inparticular when it is a NAND type, a memory cell array is configured byarranging memory cells at the respective points of intersecting columnlines and row lines. A MOS transistor having a stacked gate structureconfigured by stacking layers of a floating gate and a control gate isused as a memory cell.

The EEPROM includes an electrically erasable flash memory. Much of theflash memory in use is NAND flash memory with highly increasedintegration.

A representative memory cell of a NAND flash memory is described, forexample, in R. Shirota, “A Review of 256M-bit NAND Flash Memories andNAND Flash Future Trend”, Non-Volatile Semiconductor Memory Workshop(NVSMW) 2000, pp 22-31.

The nonvolatile semiconductor memory device has a circuit configurationsuch as that shown in the circuit diagram of FIG. 1. As shown in FIG. 1,in the memory cell unit of the NAND flash memory, a plurality of, forexample, sixteen memory cell transistors M0 to M15 form a memory block70, which is indicated by the region enclosed by the dotted line. Thememory cells are connected in series with a bit line side selecttransistor SG1 connected to one side and a source line side selecttransistor SG2 connected to the other.

Each word line WL0 to WL15 makes a one-to-one connection to the gates ofmemory cell transistors M0 to M15, respectively. A select gate line SGDis connected to the gate of the bit line side select transistor SG1. Aselect gate line SGS is connected to the gate of the source line sideselect transistor SG2.

The source of the bit line side select transistor SG1 is connected to abit line DQ which functions as a data line. The source of the sourceline side select transistor SG2 is connected to a common source line CS.

While not shown in the figures, a plurality of NAND strings 70 areconnected in the direction in which the bit line DQ extends. Inaddition, a plurality of NAND strings 70 with the same circuitconfiguration are formed for every bit line DQ in the direction in whichword line WL0, WL1, WL2, . . . , WL15 extend.

A plurality of NAND strings 70 are vertically connected in series withcontacts provided at the respective ends of the NAND strings to give aplurality of consecutive configurations where memory cell transistorsare connected via the bit line side select transistor SG1 and the sourceline side select transistor SG2, on both ends.

A plurality of word lines WL0, WL1, WL2, . . . , WL15 for memory cellgates are arranged in lines parallel to each other. At each end of theplurality of memory cell gates, respective select gate lines SGD and SGSare formed in lines parallel to each other, and parallel to the wordlines WL0, WL1, WL2, . . . , WL15 for memory cell gates. In this case,the memory cell transistors M0, M1, M2, . . . , M15 have equal gatelengths, respectively. In addition, each of the pairs of the select gatetransistors SG1, SG2 on both sides of the memory cell transistors M0,M1, M2, . . . , M15 have the same gate length, and the gate length ofthe select gate transistors SG1, SG2 is generally formed so as to belonger than the gate length of the memory cell transistor.

Spaces F (F being the minimum fabrication dimension) having the samewidth are formed between a plurality of word lines WL0, WL1, WL2, . . ., WL15 for memory cell gates. This space F is equal to the gate lengthof the memory cell gate. Moreover, the spaces F, which equal the spacesF between the memory cell gates, are formed between the select gate andmemory cell gate adjacent to the select gate.

Device activation regions are formed parallel to each other andperpendicular to the direction in which the memory cell transistors M0,M1, M2, . . . , M15 extend. Such device activation regions are segmentedinto multiple regions by a plurality of device isolation regions formedparallel to each other and perpendicular to the memory cell gate.

In this case, one NAND string is configured by forming a pair ofindividual select gates at each end of a plurality of, for example,sixteen memory cell gates. Another NAND string is formed on the end ofthis NAND string providing a space of approximately 2F, which isapproximately twice the space F formed between the memory cell gates. Inthis case, contacts are formed above the device activation regionsbetween neighboring select gates of the NAND strings.

In this manner, all gate lengths are formed with uniform lines andspaces, and arranged with the same pitch within the memory cell unit. Inaddition, the channel length of the select gate is miniaturized so as tobe the same size as that of the memory cell gate. The select gate isconfigured from two adjacent gates and functions as a select transistor.In this case, in the conventional nonvolatile semiconductor memorydevice, since the select gate length itself is approximately 2F and ison both the source side and drain side, which provides a space ofapproximately 4F, then adding the space separating the neighboringselect gates of another memory cell gate of approximately 2F to thisgives a total space of approximately 6F. Generally, the select gate islonger than the gate length of the memory cell transistor, effectivelypreventing degradation in the cut-off characteristics of a transistordue to a short-channel effect.

As shown in FIG. 1, a plurality of memory cell transistors connected inseries can provide a NAND cell (a memory cell unit). The source anddrain regions of each memory cell are connected in series throughdiffused regions fabricated in the memory device substrate region.

However, there are problems with the above conventional nonvolatilesemiconductor memory device. The configuration described above resultsin the NAND strings having irregular lines/spaces in their select gatesections, which causes fabrication margins to decrease when patterningthe select gates with lithography, as micro- and/or nano-fabricationcontinues to progress. When designed with irregular patterns, there maybe limits placed on miniaturization. In other words, if the minimum linewidth based on the limits of microscopic processing technology is givenas F, the gate lengths of memory cell transistors, gate intervals ofmemory cell transistors, and spaces between the gates of the memory celltransistors and the gates of the select transistors are all formed so asto have the width F. However, the gate width of the select transistorsis formed so as to b wider than F, such as 2F, to improve cut-offcharacteristics. This results in the presence of irregular line widthsand space widths. In other words, in the case where the lines/spaces ofthe memory cell gates are 1F and the gate length of the lines/spaces ofthe select gates is approximately 2F, the gate length for the memorycell gates adjacent to the select gates is over-etched duringlithography in the manufacturing process. Accordingly, the memory cellgates cannot be formed to the desired length, and the requiredcharacteristics cannot be obtained. Therefore, there is no other optionexcept to design all gate lengths with a value larger than the minimumline width F, which results in an increased surface area for the memorycell transistor region.

Moreover, there are times when the result is a NAND flash memory cellunit structure where the control gates (word lines) adjacent to theselect transistors are fabricated longer or shorter than the desiredvalue. This is because the regular pattern of word line gate lengths andspaces, being broken near the select transistor, makes uniformprocessing impossible. That is, if the control gates (word lines) nearthe select transistor are longer or shorter than the desired value, thecharacteristics of that memory cell differ from the characteristics ofother memory cells, which affects write/erase/read operations andinvites problems in terms of reliability.

In addition, if the regular patterns are broken, problems, such as abreakdown of the resist during the developing process of the resistafter photolithography processing, can give rise to an electricalshorting problem between the adjacent gate electrodes.

SUMMARY OF THE INVENTION

In order to solve the above problems, a first aspect of the presentinvention inheres in a nonvolatile semiconductor memory comprising: aplurality of word lines disposed in a row direction; a plurality of bitlines disposed in a column direction perpendicular to the word lines;memory cell transistors having a source region, a drain region, a gateelectrode and a charge storage layer, provided in the column directionand an electronic storage condition of the memory cell transistorconfigured to be controlled by one of the plurality of the word linesconnected to the memory cell; a plurality of first select transistors,each including a gate electrode, selecting the memory cell transistorsprovided in the column direction, arranged in the column direction andadjacent to the memory cell transistors at a first end of the memorycell transistors; and a first select gate line connected to each of thegate electrodes of the first select transistors.

A second aspect of the present invention inheres in a semiconductorintegrated circuit, comprising, a semiconductor chip; a semiconductormemory mounted on the semiconductor chip comprising: a plurality of wordlines disposed in a row direction; a plurality of bit lines disposed ina column direction perpendicular to the word lines; memory celltransistors having a charge storage layer, disposed in the columndirection and an electronic storage condition of the memory celltransistor configured to be controlled by one of the plurality of theword lines connected to the memory cell; a plurality of first selecttransistors selecting the memory cell transistors, arranged in thecolumn direction and adjacent to the memory cell transistors at a firstend of the memory cell transistors; and a first select gate lineconnected to each of the gate electrode of the first select transistors;and a logic circuit mounted on the semiconductor chip to control thesemiconductor memory.

A third aspect of the present invention inheres in a system for storinginformation and for accessing a storage medium comprising: a memory cardincluding a semiconductor memory comprises, a plurality of word linesdisposed in a row direction; a plurality of bit lines disposed in acolumn direction perpendicular to the word lines; memory celltransistors having a charge storage layer, disposed in the columndirection and an electronic storage condition of the memory celltransistor configured to be controlled by one of the plurality of theword lines connected to the memory cell; a plurality of first selecttransistors selecting the memory cell transistors, arranged in thecolumn direction and adjacent to the memory cell transistors at a firstend of the memory cell transistors; and a first select gate lineconnected to each of the gate electrode of the first select transistors.

A fourth aspect of the present invention inheres in a system for storinginformation and for accessing a storage medium comprising: an IC cardboard; a semiconductor memory disposed on the IC card board, comprising:a plurality of word lines disposed in a row direction; a plurality ofbit lines disposed in a column direction perpendicular to the wordlines; memory cell transistors having a charge storage layer, disposedin the column direction and an electronic storage condition of thememory cell transistor configured to be controlled by one of theplurality of the word lines connected to the memory cell; a plurality offirst select transistors selecting the memory cell transistors disposedin the column direction, arranged in the column direction and adjacentto the memory cell transistors at a first end of the memory celltransistors disposed in the column direction; and a first select gateline connected to each of the gate electrodes of the first selecttransistors.

A fifth aspect of the present invention inheres in a method forfabricating a nonvolatile semiconductor memory comprising: sequentiallyforming a gate insulating layer and a first conductive layer of afloating gate on a semiconductor substrate after forming a channel ionimplantation layer near a surface of the semiconductor substrate;depositing an inter-gate insulating layer with an ONO layer structure;forming a select transistor channel diffused layer by an ionimplantation process after patterning part of a planned channel regionof a plurality of select transistors by utilizing a lithography processand forming an opening; depositing a control gate electrode materialafter etching of the inter-gate insulating layer in the opening; andforming a source/drain diffused layer by an ion implantation process ofimplanting impurity ions into the semiconductor substrate afterpatterning a stacked gate layer by utilizing a lithography process andetching the stacked gate layer and forming a gate electrode of a memorycell transistor and a gate electrode of the plurality of the selecttransistors.

BRIEF DESCRIPTION OF DRAWINGS

FIG. 1 is a schematic circuit diagram of a NAND flash memory given as anexample of a conventional nonvolatile semiconductor memory device;

FIG. 2 is a schematic planar layout pattern configuration of an NANDflash memory given as a comparative example of the present invention;

FIG. 3 is a graph illustrating the relationship between a normalizedcell size and the number of NAND strings in the NAND flash memory takinginto consideration scaling rules;

FIG. 4 is a graph illustrating the relationship between a normalizedcell size and the scaling unit F (nm) when taking scaling rules intoconsideration, that is, a comparative diagram comparing an example of asingle select gate (line A) and an example of multiple select gates(line B) in the NAND flash memory;

FIG. 5A is a schematic block diagram showing the planar layout patternof a NAND flash memory according to a first embodiment of the presentinvention;

FIG. 5B is a circuit diagram of the NAND flash memory configuration inFIG. 5A;

FIG. 6 is a planar view showing the structure of a nonvolatilesemiconductor memory device according to the first embodiment of thepresent invention;

FIG. 7 is a cross-sectional diagram showing the structure of anonvolatile semiconductor memory device according to the firstembodiment of the present invention;

FIG. 8 is a planar view describing a pattern configuration which isconfigured by extending the planar view shown in FIG. 6 along thedirection of the NAND string, and repeating along the direction of thebit line;

FIG. 9 is a circuit diagram showing an example of a flash memory cellunit configured with the NAND flash memory of the nonvolatilesemiconductor memory device according to the first embodiment of thepresent invention;

FIG. 10 is a circuit diagram showing an example of a flash memory cellunit configured with AND flash memory of the nonvolatile semiconductormemory device according to the first embodiment of the presentinvention;

FIG. 11 is a planar view showing the structure of a nonvolatilesemiconductor memory device according to the first embodiment of thepresent invention;

FIG. 12 is a cross-sectional diagram showing the structure of anonvolatile semiconductor memory device according to the firstembodiment of the present invention;

FIG. 13 is a cross-sectional diagram showing a step of a manufacturingmethod of the nonvolatile semiconductor memory device according to thefirst embodiment of the present invention;

FIG. 14 is a cross-sectional diagram showing a step of the manufacturingmethod of the nonvolatile semiconductor memory device according to thefirst embodiment of the present invention;

FIG. 15 is a cross-sectional diagram showing a step of the manufacturingmethod of the nonvolatile semiconductor memory device according to thefirst embodiment of the present invention;

FIG. 16 is a cross-sectional diagram showing a step of the manufacturingmethod of the nonvolatile semiconductor memory device according to thefirst embodiment of the present invention;

FIG. 17 is a cross-sectional diagram showing a step of the manufacturingmethod of the nonvolatile semiconductor memory device according to thefirst embodiment of the present invention;

FIG. 18 is a cross-sectional diagram showing a step of the manufacturingmethod of the nonvolatile semiconductor memory device according to thefirst embodiment of the present invention;

FIG. 19 is a cross-sectional diagram showing a step of the manufacturingmethod of the nonvolatile semiconductor memory device according to thefirst embodiment of the present invention;

FIG. 20 is a cross-sectional diagram showing a step of the manufacturingmethod of the nonvolatile semiconductor memory device according to thefirst embodiment of the present invention;

FIG. 21 is a cross-sectional diagram showing a step of the manufacturingmethod of the nonvolatile semiconductor memory device according to thefirst embodiment of the present invention;

FIG. 22 is a cross-sectional diagram showing a step of the manufacturingmethod of the nonvolatile semiconductor memory device according to thefirst embodiment of the present invention;

FIG. 23 is a cross-sectional diagram showing a step of the manufacturingmethod of the nonvolatile semiconductor memory device according to thefirst embodiment of the present invention;

FIG. 24 is a cross-sectional diagram showing the structure of anonvolatile semiconductor memory device according to a first modifiedexample in the first embodiment of the present invention;

FIG. 25 is a cross-sectional diagram showing the structure of anonvolatile semiconductor memory device according to a second modifiedexample in the first embodiment of the present invention;

FIG. 26 is a cross-sectional diagram showing a step for a modifiedexample of the manufacturing method of the nonvolatile semiconductormemory device according to the first embodiment of the presentinvention;

FIG. 27 is a cross-sectional diagram showing a step for a modifiedexample of the manufacturing method of the nonvolatile semiconductormemory device according to the first embodiment of the presentinvention;

FIG. 28 is a cross-sectional diagram showing a step for the modifiedexample of the manufacturing method of the nonvolatile semiconductormemory device according to the first embodiment of the presentinvention;

FIG. 29 is an illustrative circuit diagram of a nonvolatilesemiconductor memory device according to the first embodiment of thepresent invention and shows an example of 64 M-bit NAND flash memory;

FIG. 30 is an illustrative circuit diagram of a nonvolatilesemiconductor memory device according to the first embodiment of thepresent invention and shows an example of AND flash memory;

FIG. 31A is a diagram describing an AND flash memory write operation;

FIG. 31B is a diagram describing an AND flash memory erase operation;

FIG. 32 is an illustrative circuit diagram of a nonvolatilesemiconductor memory device according to the first embodiment of thepresent invention configured with a divided bit line NOR flash memory;

FIG. 33 is an illustrative circuit diagram of a nonvolatilesemiconductor memory device configured with NAND flash memory accordingto a second embodiment of the present invention;

FIG. 34 is a planar view of an example of a nonvolatile semiconductormemory device configured with NAND flash memory according to the secondembodiment of the present invention;

FIG. 35 is a planar view of an example of a nonvolatile semiconductormemory device configured with NAND flash memory according to the secondembodiment of the present invention;

FIG. 36 is a planar view of an example of a nonvolatile semiconductormemory device configured with NAND flash memory according to the secondembodiment of the present invention;

FIG. 37 is a planar view of an example of a nonvolatile semiconductormemory device configured with NAND flash memory, according to the secondembodiment of the present invention;

FIG. 38 is a planar view of an example of a nonvolatile semiconductormemory device configured with NAND flash memory according to the secondembodiment of the present invention;

FIG. 39 is an illustrative circuit diagram of a nonvolatilesemiconductor memory device configured with AND flash memory accordingto the second embodiment of the present invention;

FIG. 40 is an illustrative circuit diagram of a nonvolatilesemiconductor memory device configured with divided bit line NOR flashmemory according to the second embodiment of the present invention;

FIG. 41 is an illustrative circuit diagram of the nonvolatilesemiconductor memory device configured with 64M-bit NAND flash memoryaccording to the second embodiment of the present invention;

FIG. 42 is a planar view of an example of a nonvolatile semiconductormemory device configured with NAND flash memory according to a thirdembodiment of the present invention;

FIG. 43 is a planar view describing a pattern configuration where theplanar view shown in FIG. 42 is extended along the NAND strings, andrepeated along the bit lines;

FIG. 44 is a planar view of an example of a nonvolatile semiconductormemory device configured with the NAND flash memory according to thethird embodiment of the present invention;

FIG. 45 is a planar view of an example of a nonvolatile semiconductormemory device configured with the NAND flash memory according to thethird embodiment of the present invention;

FIG. 46 is a planar view of an example of a nonvolatile semiconductormemory device configured with the NAND flash memory according to thethird embodiment of the present invention;

FIG. 47 is a planar view of an example of a nonvolatile semiconductormemory device configured with the NAND flash memory according to thethird embodiment of the present invention;

FIG. 48 is an illustrative circuit diagram of the nonvolatilesemiconductor memory device configured with the AND flash memoryaccording to the third embodiment of the present invention;

FIG. 49 is an illustrative circuit diagram of the nonvolatilesemiconductor memory device configured with divided bit line NOR flashmemory according to the third embodiment of the present invention;

FIG. 50 is an illustrative circuit diagram of the nonvolatilesemiconductor memory d vice configured with 64-M bit NAND flash memoryaccording to the third embodiment of the present invention;

FIG. 51 is an illustrative block diagram of page flash memory used inthe nonvolatile semiconductor memory device according to a fourthembodiment of the present invention;

FIG. 52 is an illustrative block diagram of byte flash memory used inthe nonvolatile semiconductor memory device according to the fourthembodiment of the present invention;

FIG. 53 is an illustrative block diagram of pseudo EEPROM flash memoryused in the nonvolatile semiconductor memory device according to thefourth embodiment of the present invention;

FIG. 54 is a circuit diagram of the pseudo EEPROM flash memory shown inFIG. 53 that is used in the nonvolatile semiconductor memory deviceaccording to the fourth embodiment of the present invention;

FIG. 55 is an illustrative block diagram showing the internalconfiguration of a memory card to which is applied a nonvolatilesemiconductor memory system according to the fourth embodiment of thepresent invention;

FIG. 56 is an illustrative block diagram showing the internalconfiguration of a memory card to which is applied the nonvolatilesemiconductor memory system according to the fourth embodiment of thepresent invention;

FIG. 57 is an illustrative block diagram showing the internalconfiguration of a memory card to which is applied the nonvolatilesemiconductor memory system according to the fourth embodiment of thepresent invention;

FIG. 58 is an illustrative block diagram showing the internalconfiguration of a memory card to which is applied the nonvolatilesemiconductor memory device according to the fourth embodiment of thepresent invention;

FIG. 59 is an illustrative block diagram showing the internalconfiguration of a memory card to which is applied the nonvolatilesemiconductor memory device according to the fourth embodiment of thepresent invention;

FIG. 60 is an illustrative block diagram of a memory card and cardholder to which is applied the nonvolatile semiconductor memory deviceaccording to the fourth embodiment of the present invention;

FIG. 61 is an illustrative block diagram of a connecting device operableto receive the memory card and card holder to which is applied thenonvolatile semiconductor memory device according to the fourthembodiment of the present invention;

FIG. 62 is an illustrative diagram of a coupling device, for connectingto a personal computer via a connecting wire, with an internal memorycard to which is applied the nonvolatile semiconductor memory deviceaccording to the fourth embodiment of the present invention;

FIG. 63 is a digital camera system which allows the loading of a memorycard to which is applied the nonvolatile semiconductor memory deviceaccording to the fourth embodiment of the present invention;

FIG. 64 is an illustrative block diagram of an IC card to which isapplied the nonvolatile semiconductor memory device according to thefourth embodiment of the present invention;

FIG. 65 is an illustrative block diagram showing the internalconfiguration of an IC card to which is applied the nonvolatilesemiconductor memory device according to the fourth embodiment of thepresent invention;

FIG. 66 is an illustrative block diagram showing the internalconfiguration of an IC card to which is applied the nonvolatilesemiconductor memory device according to the fourth embodiment of thepresent invention;

FIG. 67 is an illustrative block diagram showing the internalconfiguration of an IC card to which is applied the nonvolatilesemiconductor memory device according to the fourth embodiment of thepresent invention; and

FIG. 68 is an illustrative block diagram showing the internalconfiguration of an IC card to which is applied the nonvolatilesemiconductor memory device according to the fourth embodiment of thepresent invention.

DETAILED DESCRIPTION OF THE INVENTION

Various embodiments of the present invention will be described withreference to the accompanying drawings. It is to be noted that the sameor similar reference numerals are applied to the same or similar partsand elements throughout the drawings, and the description of the same orsimilar parts and elements will be omitted or simplified.

Generally and as it is conventional in the representation of circuitblocks, it will be appreciated that the various drawings are not drawnto scale from one figure to another nor inside a given figure, and inparticular that the circuit diagrams are arbitrarily drawn forfacilitating the reading of the drawings.

In the following descriptions, numerous specific details are set forthsuch as specific signal values, etc. to provide a thorough understandingof the present invention. However, it will be obvious to those skilledin the art that the present invention may be practiced without suchspecific details. In other instances, circuits well-known have beenshown in block diagram form in order not to obscure the presentinvention in unnecessary detail.

Next, a description will be given of the embodiments of the presentinvention with reference to the drawings. The same or similar referencenumerals are given for the same or similar parts in the followingdrawings. The embodiments shown below exemplify an apparatus or a methodfor embodying technical ideas of the present invention. The technicalideas are not intended to be limited by the structures, arrangements, orthe like of the components described below. Various modifications can beadded to the technical ideas of the present invention within the scopeof claims.

Comparative Example

A scaling or design rule for NAND flash memory is described forthwith.When miniaturizing such NAND flash memory cells, for instance taking asan example the case where the design rule F is set to 0.09 μm as shownin FIG. 2, the gate length of the bit line side select gate line SGD isY F, and the gate length of the source line side select gate line SGS isalso Y F. Accordingly, these gate lengths are longer than the gatelengths F of the control gates (word lines) WL1 through WL32. Inaddition, the space X F between the word line WL1, which is locatedclosest to the bit line DQ, and the bit line side select gate line SGD,and the space X F between the word line WL32, which is located closestto the source line CS, and the source line side select gate line SGS arewider than the space F between the word lines.

This is because the gate lengths Y F of the bit line side select gateline SGD and source line side select gate line SGS are longer than thegate lengths F of the control gates (word lines) WL1 through WL32 inorder to improve the punch-through immunity of both select transistorsSG1 and SG2. This is also to prevent the channel electric potential,which has caused the NAND strings from becoming write-restricted, fromincreasing due to capacitive coupling during a write-in and fromdecreasing as a result of a leakage current flowing through the selecttransistors SG1 and SG2. If the select transistors SG1 and SG2 causepunch-through and the write-restricted electric potential is decreased,erroneous write-in may occur in a cell that should not be written. Inaddition, the space X F between the word line WL1, which is locatedclosest to the bit line DQ, and the bit line side select gate line SGD,and the space X F between the word line WL32, which is located closestto the source line CS, and the source line side select gate line SGS areeach wider than the space F between the word lines. This is so that thefabrication margins for the non-periodical layout pattern of the wordlines can be improved so as to obtain a sufficient cut-offcharacteristic of the select gate transistors. Thereby, a tendency thatthe gate lengths of the bit line side select gate line SGD and sourceline side select gate line SGS are longer than the control gates (wordlines) WL1 through WL32, and a space between the word line WL1 which islocated nearest to the bit line DQ and the bit line side select gateline SGD and a space between the word line WL32 which is located nearestto the source line CS and the source line side select gate line SGS arewider than the space between the word lines is more pronounced. Itshould be noted that BC and SC are a bit line contact hole and sourceline contact hole, respectively.

The relationship between normalized cell size and the number of memorycells in a NAND string that is generally found in NAND flash memory isshown in FIG. 3. A cell size of one transistor is 4 F², where the valueof F indicates a scaling unit for the minimum fabrication dimension. F₁and F₂ refer to scaling rules, wherein F₂ is greater than F₁. Forexample, the value of F₁ and F₂ is equal to 0.4 μm and 0.13 μm,respectively. Since the select gate region cannot be formed with thesame design rule as the memory cell region, the surface area of theselect gate region is relatively larger in comparison withminiaturization of the memory cell region. Accordingly, furtherminiaturization of the scaling rule, causes the surface area effect tobe manifestly more pronounced in the select gate.

In addition, in the case where there are many memory cells on the NANDstring, a tendency of one transistor to approach the cell size 4F² maybe seen because of the surface area effect in the select gate regionbeing low in comparison with that in the memory cell region.Nevertheless, if the number of memory cells in the NAND strings decreaseand miniaturization progresses further, the normalized cell sizeincreases drastically.

Therefore, in the first embodiment of the present invention, atechnology to suppress an increase in memory cell size is discussedusing a structure where two select gate lines, and different electricpotential is supplied to each, respectively. The second embodiment ofthe present invention corresponds to a case where two select gate lines,and equal electric potential is supplied to each, respectively. Thethird embodiment of the present invention corresponds to a case wherethere are three select gates, and equal electric potential or differentelectric potential is supplied to each. Moreover, the fourth embodimentof the present invention corresponds to system application examples ofthe nonvolatile semiconductor memory devices of the first through thirdembodiment of the present invention, such as memory cards and IC(interface circuit) cards etc.

First Embodiment

The first embodiment corresponds to a case where there are two selectgates, and different electric potential is supplied to each gate.

FIG. 5A and FIG. 5B show a planar view of an NAND flash memory cell unitaccording to an embodiment of the present invention and an equivalentcircuit, respectively. In this example, 0.09 μm is used as the designrule F. The gate lengths of bit line side select gate lines SGD1 andSGD2, source line side select gate lines SGS1 and SGS2, and controlgates (word lines) WL1 through WL32 are identically equal to F (=90 nm).Identically, the spaces of lines among the bit line side select gatelines SGD1 and SGD2, source line side select gate lines SGS1 and SGS2,and control gates (word lines) WL1 through WL32 are also F (=90 nm). Inthis case, the present invention is also applicable when the gatelengths and the space between lines are different by setting the gatelengths of the bit line side select gate lines SGD1, SGD2, source lineside select gate lines SGS1, SGS2, control gates (word lines) WL1through WL32 to 100 nm, and the space between the lines to 80 nm. FIG.5A and FIG. 5B show an example of connecting thirty-two memory cells inseries. The length of this thirty-two NAND string is 6.59 μm, which isapproximately the same size as the conventional case of 6.58 μm wherethe select transistors are integrated as one (FIG. 2). Nevertheless, asfurther miniaturization advances and the design rule becomes for example0.07 μm or 0.055 μm, the present invention, where the gate of the selecttransistor is divided into two—is shorter as far as the length of theNAND strings is concerned. As a result, the chip size may be minimized,and achieve cost reductions in addition to process and reliabilityimprovements. Moreover, a contact hole BC for the bit line DQ is openedat an upper side of the bit line select gate line SGD2, and a contacthole SC for the source line CS is opened at a lower side of the sourceline select gate line SGS2

In addition, since the select transistors on both the bit line side andsource line side are configured with two gates, the punch-throughimmunity may be improved even if the gate length is not increased. Thatis because the voltage is divided for the first and second selecttransistors since the two select transistors are substantially connectedin series, and therefore a high electric field is not applied betweenthe drain and source of each select transistor. As a result, there is noneed to increase the gate lengths of the first and second selecttransistors respectively, which allows the gate lengths to be the samelength as the gate length of the control gate.

As described above, it is possible to form the first and second selecttransistors with the same pitch (gate length and space) as the controlgate with the surface area reduction results being more pronounced asthe design rule decreases.

A planar configuration of a memory cell unit of a NAND nonvolatilesemiconductor memory device according to the first embodiment of thepresent invention is shown in FIG. 6. As shown in FIG. 6, a plurality ofmemory cell gates 1 j are arranged in lines parallel to each other. Oneach end of such a plurality of memory cell gates 1 j . . . 1 j, twoselect gates 2 j, 2 j are formed parallel to each other, and in linesparallel to the memory cell gates 1 j. In this case, a plurality ofmemory cell gates 1 j have respectively equal gate lengths W1. It shouldbe noted that the plurality of memory cell gates 1 j may be configuredin numbers such as eight, sixteen, or the like. In addition, two selectgates 2 j 2 j have respectively equal gate lengths W2. The gate lengthW2 may be equal to the gate lengths W1 of the individual memory cellgates 1 j, or may be formed with differing dimensions.

Spaces F (F being the minimum fabrication dimension) having the samewidth are formed between the memory cell gates 1 j. This space F isequal to the gate length W1 of the memory cell gate 1 j. The gate lengthof the select gate 2 j is equal to W2. Moreover, spaces F, which areequal to the spaces F between the memory cell gates 1 j, are formedbetween the select gate 2 j and the memory cell gate 1 i adjacent to theselect gate 2 j.

Device activation regions 3 are formed parallel to each other and in adirection perpendicular to the lines of memory cell gates 1 j. Suchdevice activation regions 3 are segmented into multiple regions by aplurality of device isolating regions 4 formed parallel to each otherand in a direction perpendicular to the lines of memory cell gates 1 j.In this case, one NAND string 5 j is configured by forming two selectgates 2 j, 2 j on both ends of a plurality of, for example, sixteenmemory cell gates 1 j. On the ends of this NAND string 5 j, another NANDstring 5 j+1 is formed providing a space F which is identical to thespace F between the memory cell gates 1 j. In this case, contact plugs 6are formed above the device activation regions 3 between the selectgates 2 j and 2 j−1 adjacent to each other on the NAND strings 5 j and 5j−1. The contact plugs 6 are formed above the device activation regions3 between the select gates 2 j and 2 j+1 adjacent to each other on theNAND strings 5 j and 5 j+1.

In this manner, all gate lengths are formed with uniform lines andspaces, and arranged with the same pitch within the memory cell unitwhich is configured from a plurality of the NAND strings 5 j, 5 j+1,5j+2, . . . . In addition, the channel length of the select gate may beminiaturized to the same size as the memory cell gate 1 j−1, 1 j, 1 j+1.The select gate 2 j−1, 2 j, 2 j+1 is configured from a plurality ofadjacent gates and functions as a select transistor.

A cross-sectional diagram of a NAND string 5 j cut along line I-I inFIG. 6 is shown in FIG. 7. As shown in FIG. 7, memory cell gates 1 j andselect gates 2 j are formed in a p well region formed in a semiconductorsubstrate 10. Source/drain diffused layers 11 are formed in thesemiconductor substrate 10 surrounding such memory cell gates 1 j andselect gates 2 j. Channel ion implantation layers 12 are formed underrespective memory cell gates 1 j and select gates 2 j in thesemiconductor substrate 10. In addition, contact plugs 6 are connectedto the source/drain diffused layer 11 outside of the select gate 2 j atthe end of the NAND string 5 j.

First conductive layers 14 which function as a floating gate, or acharge storage layer, is formed on the semiconductor substrate 10 viagate insulating layers 13 under respective memory cell gates 1 j andselect gates 2 j. On the for going structure, a first conductive layer14 and second conductive layer 16, which function as a control gate, areformed via inter-gate insulating layers 15. The inter-gate insulatinglayer 15 is, for example, made of an ONO layer which has a stackedsilicon oxide layer-silicon nitride layer-silicon oxide layerconfiguration.

In this case, in the select gates 2 j, due to the existence of thisinter-gate insulating layer 15, electric potential is applied only tothe lower charge storage layer 14 while the upper control gate 16 iskept insulated.

Unlike the memory cell gate 1 j, in the select gate 2 j, electricpotential is supplied only to the first conductive layer 14 of the firstlayer. In this case, electric potential is supplied independent of thesecond conductive layer 16 by extending the first conductive layer 14above the device isolating region 4 as shown in FIG. 6.

Since a pair of two select gates 2 j, 2 j is used on each end of therespective NAND strings 5 j, a length of 3F is required for the selectgate region. In other words, since the gate length of a select gate 2 jis F and there are two select gates, the total gate length occupies 2Fplus the space F between the two gates so as to require a total of 3F.

Accordingly, the space between select gates 2 j is F. If it had beenassumed that the gate length of the select gate 2 j in the conventionalmethod was 2F, the total length would be 6F in the conventional method,as compared with the nonvolatile semiconductor memory device of thepresent embodiment, where the required space is 7F. Accordingly, thedevice causes some increase in chip surface area. However, since thefabrication margins may be improved, the result provides substantialmerit towards the reduction of chip surface area if it is possible tominiaturize the design rule to the degree that the small incrementalincrease is cancelled.

In other words, in the nonvolatile semiconductor memory device in thefirst embodiment of the present invention, since the space betweenselect gates is F, the length of two select gates 2 j is 2F, and then ifthe space F between the select gates is added to 2F, a space of 3F isobtained, which is on both the source side and drain side so as toproduce a space of 6F. Then, the addition of the space separatinganother memory cell provides the total space of 7F.

In this manner, even in a case where lengths other than the memory cellportion of the memory unit formed with the NAND strings 5 j are enlargedfrom 6F to 7F by providing the select gate 2 j with the same pitch andgate length as the memory cell gate 1 j, miniaturization of the memorycell unit may be achieved. The miniaturization can occur if F can beminimized to such a degree that the combined total space can overcomethe foregoing incremental increase.

For example, in a case where F can only be minimized down to 0.1 μm inthe conventional irregular pattern, but can be minimized down to 0.09 μmwhen the first embodiment of the present invention is applied, thelength other than the memory cell section of the memory cell unit is0.6, which is a product obtained by multiplying 6 by 0.1, of theconventional configuration. In contrast, with the nonvolatilesemiconductor memory device in the first embodiment of the presentinvention, the length is 0.63, which is the product obtained bymultiplying 7 by 0.09. This means that a smaller surface area could beachieved by the present embodiment if F could be further minimized.

Comparing a case of having a single select gate and a case of having aplurality of select gates, when the relationship between normalized cellsize and the scaling unit F in NAND flash memory is shown, as in FIG. 4,the graphs for when there is a single select gate and when there is aplurality of select gates intersect at point F0. While a large increasein normalized cell size may be seen in the case of single gate structure(line A) as miniaturization progresses, the increase in cell size issuppressed when there is a plurality of select gates (line B). The valueof F0 is, for example, given as being somewhere around 0.09 μm. In theNAND flash memory with a plurality of select gate lines such as shown ina line B in FIG. 4, even if a scaling unit F is miniaturized to lessthan 0.09 μm, an increase in the normalized cell size can be suppressedand the intrinsic performance of the NAND flash memory can be achieved.

In addition, in the NAND strings 5 j of the conventional nonvolatilesemiconductor memory device, margins for patterning the irregularpatterns decrease if the space between the select gate 2 j and memorycell gate 1 j is F. Moreover, in the case where all units are arrangedwith the same pitch, such as the nonvolatile semiconductor memory devicein the first embodiment of the present invention, there is no need tofear degradation in localized lithography margins. Thus, all thepatterns of the memory cell gate lines 1 j are selected to have the samelines and spaces, and all the patterns of the select gate lines 2 j areselected to have the same gate length with the memory cell gates 1 j soas to provide a fabrication margin, the improvement can be expected inthe fabrication margins relative to the miniaturization.

In this case, it is possible to control the two select gates 2 j, 2 jformed adjacent to each other with the same signal line. In addition,the cut-off characteristics of each select gate 2 j may be changed bycontrolling two select gates 2 j, 2 j independently with differenttiming depending on the circumstances of operation. In this case, acontrol circuit is provided in order to control the respective selectgates 2 j.

In addition, the number of gates of the select gates 2 j on the sourceside in the NAND strings 5 j may be one, and the number of the gates ofthe select gates 2 j on the drain side may be two, depending on thecircumstances of operation. In this case, even if a leakage should occuron the source side, there is no problem as long as the leakage fallswithin an allowable range.

Moreover, the number of gates of the select gates 2 j on the source sidein the NAND strings 5 j may be two, and the number of gates of theselect transistors on the drain side may be one, depending on thecircumstances of operation. In this case, even if a leakage should occuron the drain side, there is no problem as long as the leakage fallswithin an allowable range.

With the nonvolatile semiconductor memory device in the first embodimentof the present invention, miniaturization may be achieved by improvingthe cut-off characteristics of the select transistors, and the selecttransistors and memory cell transistors may obtain respective channellength dependency with respectively different transistor thresholdvoltages.

FIG. 8 is a planar view describing a pattern configuration which isconfigured by extending the planar view shown in FIG. 6 along the NANDstrings 5 j, 5 j+1, . . . , repeating along the bit lines. A firstmemory cell gate group 11 a in the NAND string 5 j+1 includes firstselect gate groups 21 a and 21 b adjacent to the drain side, and secondselect gate groups 22 a and 22 b adjacent to the source side. A secondmemory cell gate group 12 b in the NAND string 5 j includes third selectgate groups 23 a and 23 b adjacent to the source side, and fourth selectgate groups 24 a and 24 b adjacent to the drain side. Thus the NANDstrings 5 j, 5 j+1, . . . , are arranged in a pattern configuration thatrepeats about the drain side bit line DQ or source side source line CSas shown in FIG. 8.

In this case, a nonvolatile semiconductor memory device having thecross-sectional configuration shown in FIG. 7 has a circuitconfiguration as shown in the circuit diagram of FIG. 9. As shown inFIG. 9, in the memory cell unit of the NAND flash memory, a pluralityof, for example, sixteen memory cell transistors M0 to M15 form a NANDstring 5 j in a memory block 5, which is indicated by the regionenclosed by the dotted line, and the transistors being connected inseries with two bit line side select transistors SG11 and SG12 connectedto one side and two source line side select transistors SG21 and SG22 tothe other.

The NAND cell (memory cell unit) is a memory cell array formed byconnecting a plurality of memory cells in series. The source and drainof each memory cell transistors H0, M1, M2, . . . , M15 isinterconnected in series via the diffused layer region formed in thedevice region.

Each word line WL0, WL1, WL2, . . . , WL15 makes a one-to-one connectionto the gates of memory cell transistors M0, M1, M2, . . . , M15,respectively. A first bit line side select gate line SGD1 is connectedto the gate of the first bit line side select transistor SG11, and asecond bit line side select gate line SGD2 is connected to the gate ofthe second bit line side select transistor SG12. A first source lineside select gate line SGS1 is connected to the gate of the first sourceline side select transistor SG21, and a second source line side selectgate line SGS2 is connected to the gate of the second source line sideselect transistor SG22.

The source of the second bit line side select transistor SG12 isconnected to a bit line DQ which is a data line. The source of thesecond source line side select transistor SG22 is connected to commonsource line CS.

While not shown in the figure, a plurality of NAND strings 5 j areconnected in the direction in which the bit line DQ extends. Inaddition, a plurality of NAND strings 5 j with the same circuitconfiguration, are formed for every bit line DQ in the direction inwhich the word line WL0, WL1, WL2, . . . , WL15 extends.

It should be noted that it is acceptable for the bit line side selecttransistors SG11, SG12 and source line side select transistors SG21,SG22 for selecting the memory cell block to be arranged on not only bothsides but only one side of the memory cell transistors M0, M1, M2, . . ., M15.

The NAND strings 5 j are vertically connected in series, and there are aplurality of sequential configurations where the contact plugs 6 arerespectively formed at the ends of the NAND strings, and memory celltransistors are connected via the select transistors at both ends.

The first embodiment of the present invention is not limited to a NANDflash memory, and may also be applied to an AND flash memory, a circuitdiagram of a memory cell unit of which is shown in FIG. 10. In this caseas well, the memory cell transistors configure a nonvolatile memory cellarray configured with one or more transistors structured having afloating gate as a charge storage layer.

In other words, as shown in FIG. 10, in the memory cell unit of the ANDflash memory, a plurality of, for example, sixteen memory celltransistors M0, M1, M2, . . . , M15 that form the memory block 20, whichis indicated by the region enclosed by the dotted line, and thetransistors being connected in parallel with two bit line side selecttransistors SG11 and SG12 connected to one side and two source line sideselect transistors SG21 and SG22 to the other side.

The AND cell (memory cell unit) is a memory cell array formed byconnecting a plurality of memory cell transistors M0, M1, M2, . . . ,M15 in parallel. The source and drain of each memory cell transistorsM0, M1, M2, . . . , M15 are interconnected in parallel via the diffusedlayer region formed in the device region.

Each word line WL0, WL1, WL2, . . . , WL15 makes a one-to-one connectionto the gates of memory cell transistors M0, M1, M2, . . . , M15,respectively. A first bit line side select gate line SGD1 is connectedto the gate of the first bit line side select transistor SG11, and asecond bit line side select gate line SGD2 is connected to the gate ofthe second bit line side select transistor SG12. A first source lineside select gate line SGS1 is connected to the gate of the first sourceline side select transistor SG21, and a second source line side selectgate line SGS2 is connected to the gate of the second source line sideselect transistor SG22.

The source of the second bit line side select transistor SG12 isconnected to the bit line DQ which function as a data line. The sourceof the second source line side select transistor SG22 is connected to acommon source line CS.

While not shown in the figure, a plurality of such memory blocks 20 areconnected in the direction in which the bit line DQ extends. Inaddition, a plurality of similar memory blocks are formed for every bitline DQ in the direction in which the word line WL0, WL1, WL2, . . . ,WL15 extends.

It should be noted that it is acceptable for the bit line side selecttransistors SG11, SG12 and source line side select transistors SG21,SG22 for selecting the memory cell block to be arranged on not only bothsides but only one side of the memory cell transistors M0, M1, M2, . . ., M15.

In this manner, this embodiment may be applied to not only a NAND flashmemory but also an AND flash memory. In other words, by setting the gatelength of the select gates to be the same as that of the memory cell,and arranging select gates with the same pitch, it is possible toimplement a memory cell configuration that facilitates lithographicmicro-fabrication of flash memory cells having select gates.

The first embodiment of the present invention achieves a memory cellarray that has a high exposure margin and is down-scalable forminiaturization. In the case of having the same gate length as that ofthe memory transistor, it is impossible to obtain desired transistorcharacteristics of the select transistor due to the short-channeleffects of the select gate and the like, but favorable transistorcharacteristics can be achieved by coupling two select gates.

In the nonvolatile semiconductor memory device of the first embodimentof the present invention, by connecting two transistors having an F gatelength in series, it is possible to obtain the same characteristics asthe transistors having a 2F gate length, and cut-off characteristicsequivalent to the cut-off characteristics of a transistor having a gatelength of 2F.

Modified Example 1 of the First Embodiment

The planar configuration of a memory cell unit in the modified example 1of the first embodiment of the present invention is shown in FIG. 11.

As shown in FIG. 11, a plurality of memory cell gates 1 are formed inlines parallel to each other. On one end of such plurality of memorycell gates 1 j, two respective select gates 21 j, 21 j are formed inlines parallel to each other, and parallel to the lines of memory cellgates 1 j. In this case, the plurality of memory cell gates 1 j haveequal gate lengths W1, respectively. It should be noted that theplurality of memory cell gates 1 may be configured in groups such as ofeight, sixteen, or the like. In addition, the pair of two select gates21 j have respectively equal gate lengths W2. The gate length W2 may beequal to the gate lengths W1 of the individual memory cell gates 1 j, ormay be formed with different dimensions.

Spaces F (F being the minimum fabrication dimension) having the samewidth are formed between the memory cell gates 1 j. The space F may beformed equal to the gate lengths W1 of the individual memory cell gates1, or may be formed with different dimensions. The space F may also beformed equal to the gate lengths W2 of the individual select gates 21 j,or may be formed with different dimensions. Moreover, spaces F whichequal the spaces F between the memory cell gates 1 j, are formed betweenthe select gate 21 j and memory cell gate 1 j adjacent to this selectgate 21 j.

Device activation regions 3 are formed parallel to each other and in adirection perpendicular to the lines of memory cell gates 1 j. Suchdevice activation regions 3 are segmented into multiple regions by aplurality of device isolating regions 4 formed parallel to each otherand in a direction perpendicular to the lines of memory cell gates 1 j.

Upon each device activation region 3 of each select gate 21 j, anopening 22 for performing ion implantation into the select transistorchannel sections is formed.

Moreover, in the planar view of FIG. 11, a self-aligned impurityimplantation is performed into the opening 22 indicated by a dotted linesubstantially centered about the intersection of the device activationregion 3 and select gate 21 j. As a result, although the select gatelines 21 j and memory cell gates 1 j are provided in a high densityarrangement, it is possible to individually form respective self-alignedimpurity densities at different channel sections.

The source and drain of each cell are interconnected in series via theactive region 3.

In this case, one NAND string 23 j is configured by forming a pair oftwo select gates 21 j, 21 j on each end of the plurality of, forexample, sixteen memory cell gates 1 j. On the ends of NAND string 23 j,yet another NAND string 23 j−1, 23 j+1 is formed providing a space Fwhich is identical to the space F between the memory cell gates 1 j. Inthis case, contact plugs 24 are formed above the device activationregions 3 between the select gates 21 j−1, 21 j adjacent to each otherin the NAND strings 23 j−1, 23 j.

In this manner, all gate lengths are formed with uniform lines andspaces, and arranged with the same pitch within the memory cell unit. Inaddition, the channel length of the select gate 21 j is miniaturized tothe same size as that of the memory cell transistor. The select gate 21j is configured with two gates, and functions as a select transistor.

A cross-sectional diagram cut along line II-II in FIG. 11 is shown inFIG. 12. As shown in FIG. 12, memory cell gates 1 and select gates 21are formed on a semiconductor substrate 10. Source/drain diffused layers11 are formed in the semiconductor substrate 10 surrounding such memorycell gates 1 and select gates 21. The channel ion implantation layers 12are formed under respective memory cell gates 1 in the semiconductorsubstrate 10. In addition, in the semiconductor substrate 10 below theselect gate 21, a channel ion implantation layer 25, which is implantedvia an opening 22 is formed. Moreover, contact plugs 24 are formed inthe source/drain diffused layer 11 outside of the select gate 21 at theend of the NAND string 23.

First conductive layer 14 which functions as a floating gate, or chargestorage layer, is formed on the semiconductor substrate 10 via the gateinsulating layer 13 in each memory cell gate 1. Upon this firstconductive layer 14, a second conductive layer 16 which functions ascontrol gate is formed via inter-gate insulating layer 15. Theinter-gate insulating layers 15 are, for example, made of an ONO layerwhich has a stacked silicon oxide layer-silicon nitride layer-siliconoxide layer configuration.

In this case, the first conductive layer 14 which functions as afloating gate, or charge storage layer, is formed on the semiconductorsubstrate 10 via the gate insulating layer 13 in each select gate 21.Upon this first conductive layer 14, the inter-gate insulating layer 15is formed. In that inter-gate insulating layer 15, openings 22 areformed. Upon the inter-gate insulating layer 15 and openings 22, asecond conductive layer 16 which functions as control gates is formed.Conductive materials that are made of the same material as the secondconductive layer 16 are embedded in opening 22, and function asconnecting sections where the second conductive layer 16 and firstconductive layer 14 are electrically connected. The inter-gateinsulating layer 15 is, for example, made of an ONO layer which has astacked silicon oxide layer-silicon nitride layer-silicon oxide layerconfiguration.

In addition, near the surface of the region between the source and draindiffused layer 11 in the semiconductor substrate 10, a channel ionimplantation layer 12 is formed contacting the source/drain diffusedlayers 11. Moreover, near the surface of the semiconductor substrate 10,select transistor channel diffused layers 25 are formed in the regionincluding at least a region immediately below the opening 22 enclosed bythe source/drain diffused layers 11.

The select transistor channel diffused layer 25 is formed so that theimpurity density is higher than that in the memory cell transistorchannel diffused layers 12, and the depth in the semiconductor substrate10 is deeper than that of the memory cell transistor channel diffusedlayers 12.

In this case, the size of the opening 22 formed in the inter-gateinsulating layers 15 under the select gate 21 is approximately half thelength of the select gate 21.

It should be noted that it is possible to change the length of theselect transistor channel diffused layers 25 by controlling the lengthof the opening 22 in the select gate 21.

In addition, it is possible to freely set the density of the selecttransistor channel diffused layer 25 by controlling the ion implantationdosage implanted under the select gate 21 via the opening 22,independent of the memory cell transistor.

It should be noted that the impurity density of the channel section ofthe select gate 21 is, for example, approximately 10¹⁷ cm⁻³. Inaddition, the height of the memory cell gate 1 is formed to be equal tothe height of the select gate 21.

As with the first embodiment, the modified example 1 of the firstembodiment allows implementation of a memory cell configuration thatfacilitates lithographic micro-fabrication of flash memory cells for notonly a NAND flash memory but also an AND flash memory having selectgates by setting the gate length of the select gates to be the same asthat of the memory cells, and arranging the select gates with the samepitch.

In this manner, the select gates 21 are configured to supply electricpotential to the first conductive layers 14, so as to function in thesame manner as a general MOSFET, and have a composition and size similarto a memory cell transistor, except for the fact that the multi-layergate structure includes an opening.

Moreover, in the modified example 1 of the first embodiment of thepresent invention, since the impurity density in the channel region ofthe select transistor may be set so as to be higher than the impuritydensity in the channel region of the memory cell transistor, the selecttransistor threshold value may be set so as to be higher than the memorycell transistor threshold value. Therefore, it is possible to provide anonvolatile semiconductor memory device with the cut-off characteristics(current cut-off characteristics) required for the select transistor.

In addition, the first conductive layer 14 and the second conductivelayer 16 of the select transistor are connected via an opening 22 formedin the inter-gate insulating layers 15. By developing a nonvolatilesemiconductor memory device with such configuration, it is possible toprovide a minute nonvolatile semiconductor memory device which includesselect transistors having required channel ion density and memory celltransistors having a channel density where the density is set lower soas to be suitable for miniaturization, and having various favorablememory cell transistor characteristics, such as data writecharacteristics, data hold characteristics, and tolerance towards readstress.

Next, a fabrication method of the nonvolatile semiconductor memorydevice of the modified example 1 of the first embodiment of the presentinvention is described while referencing FIG. 12 through FIG. 28. FIG.12 through FIG. 28 correspond to a partial or entire cross section cutalong II-II line in FIG. 11.

(a) To begin with, as shown in FIG. 13, sacrificed silicon oxide layers30 are formed on the semiconductor substrate 10 configured with p-typesilicon. Next, p wells or double wells configured with n well and pwell, depending on the configuring requirements, are formed andactivated. Next, in the case of forming an n channel transistor on thesemiconductor substrate 10 or in the region where a well is formed,channel ion implantation of p type impurities such as boron (B) isperformed simultaneously to both the memory cell transistor and selecttransistor for controlling channels, and impurity ion implantationlayers 12 are formed near the surface of the semiconductor substrate 10as shown in FIG. 13.

(b) Next, as shown in FIG. 14, the sacrificed silicon oxide layers 30formed for ion implantation are peeled off and gate insulating layers 13are formed. A floating gate electrode layer 14 is formed as gateelectrode material for floating gate electrodes by means of, forexample, deposition of a polysilicon. In order to make this polysiliconconductive, for example, doping with phosphorous (P) may be used.Alternatively, phosphorous may be ion implanted through an ionimplantation process. Next, on this floating gate electrode layer 14,mask material 31, for example, a silicon nitride layer (Si₃N₄) isdeposited for processing a device isolating region 4.

(c) Next, as shown in FIG. 15, the mask material 31 made of the siliconnitride layer is removed. Next, as shown in FIG. 16, inter-gateinsulating layers 15 are deposited on the exposed surface so as to forma stacked layer, such as the ONO layer. Next, as shown in FIG. 17, onthe deposited inter-gate insulating layer 15, polysilicon, or other maskmaterial, such as a silicon nitride layer is deposited as the maskmaterial 32.

(d) Next, as shown in FIG. 18, by patterning a part of the plannedchannel regions of the select transistor of the memory cell unit byutilizing the lithography process, an opening 34 is formed afterdepositing a photo resist 33 on the mask material 32. A state where twoopenings 34 have been formed is shown here.

(e) Next, as shown in FIG. 19, the mask material 32 immediately belowthe opening 34 of the photo resist 33 is etched and exposed. A methodcapable of fabricating the minimum process feature size in eachgeneration in the semiconductor manufacturing technology is used forfabrication when patterning the mask material (where normally, expensivemicroscopic fabrication technology with highest performance is used).Accordingly, misalignment of the opening formed on the mask materialsmay be kept to a minimum.

(f) Next, as shown in FIG. 20, the photo resist 33 is removed, ionimplantation is performed in the semiconductor substrate 10 which isused as the channel region of the select transistor via the inter-gateinsulating layer 15, floating electrode gate 14, and gate insulatinglayer 13, and the select transistor channel diffused layer 25 areformed. Boron (B) is typically used as the ion implantation species inthis case. However, phosphorus (P) may be used in the case ofsurface-channel type p channel MOS. In this case, mask material 32 isprovided in the memory cell transistor region and a layer thickness isconfigured so that the ion-implanted ionic species attenuates in themask material 32, and the acceleration energy of ion implantation isadjusted so as to penetrate to the semiconductor substrate 10 havingsurpassed the charge storage layer. In this example, ion implantation isperformed without the photo resist 33 remaining. However, it is possibleto perform ion implantation while the photo resist 33 still remains, andremove the photo resist 33 thereafter.

(g) Next, as shown in FIG. 21, the inter-gate insulating layers 15 belowthe opening 34 are etched and exposed. It should be noted that ionimplantation for forming the select transistor channel section diffusedlayers 25 may be performed after etching is performed to make openingsin the inter-gate insulating layer 15. It should be noted that if ionimplantation is performed while the inter-gate insulating layer 15remains, it is possible to prevent contamination of the surface of thefloating gate electrode layer 14 configured with a polycrystallinesilicon layer, and the inter-gate insulating layer 15 may be used as aprotection layer.

(h) Next, as shown in FIG. 22, the mask materials 32 are peeled off.Polysilicon and tungsten silicide (WSi) are then deposited as controlgate electrode material 16 and the metal silicide, respectively. In thiscase, it is also permissible for only a polysilicon to be deposited asthe control gate material. In such a case, after performing gatefabrication by depositing polysilicon, silicide electrodes may be formedusing the self-aligned silicide (Salicide) method.

(i) Next, as shown in FIG. 23, the gate electrode region is patternedthrough the lithography process, and the multi-layered gate structure issubjected to an etching process in order to form memory cell transistorgate electrodes configured with the charge storage layer 14, inter-gateinsulating layer 15, and control gates 16, and select transistor gateelectrodes configured with the charge storage layer 14, inter-gateinsulating layer 15, and control gates 16 so as to have the same gatelength and same pitch. RIE is used for this etching process. A pair oftwo control gates are formed at each end of the memory cells in eachmemory cell unit.

(j) Next, as shown in FIG. 24, impurities are ion implanted in thesemiconductor substrate 10 in order to form source/drain regions bymasking the memory cell transistor gate electrodes and select transistorgate electrodes having a multi-layered gate structure. In particular,the modified example 1 of the first embodiment becomes possible withoutadding a lithography step by performing ion implantation after opening athrough hole in the inter-gate insulating layer 15 of the selecttransistor in order to electrically short circuit the floating gate andcontrol gate. With this manufacturing method, a method for removing apart of the inter-gate insulating layer 15 which divides the chargestorage layer 14 and control gate 16 is adopted. This method is appliedto the select gate 21 in the memory cell unit. This method permitsmaking contact with the charge storage layer 14, however, if thefollowing conditions are satisfied, it is possible to perform ionimplantation in only the channel section of the select gate through thefloating gate during this manufacturing process.

In other words, if impurities are attenuated in the mask materialsthrough ion implantation in the memory cell gate 1 so that theimpurities do not reach the charge storage layer 14 and through theselect gate 21, the ion implanted impurities implanted with the chargestorage layer 14 and gate insulating layer 13 between, are implanted inthe semiconductor substrate 10 in order to form channel regions havingdifferent impurity densities in the memory cell gate 1 and select gate21. Thus, it is possible to form respective channel sections so as tosatisfy the memory cell characteristics and select gate characteristics,and to achieve improvement of the respective characteristics through theself-alignment process without adding a lithography step.

Self-aligned channel ion implantation in the select gate 21 may beperformed, if there is no misalignment and channel impurities may beformed in the select gate 21.

Here, obtaining accurate mask alignment tolerance can be expected forthe ion implantation process of the threshold voltage control for thefirst bit line side select transistor SG11 having the first bit lineside select gate line SGD1 and for the first source line side selecttransistor SG21 having the first source line side select gate line SGS1.Therefore, even if a mask misalignment is performed for the ionimplantation process and the threshold voltage of the first selecttransistors SG11, SG21 having select gate lines SGD1, SGS1, respectivelybecomes lower than the threshold voltage of the second selecttransistors SG12, SG22 having select gate lines SGD2, SGS2,respectively, the cut off leakage current problem can be easily solved,because there are at least two select transistors for both the sourceline side and the bit line side. As a result, there is no need to designa space to be wider between the bit line side select gate line SGD1 andadjacent control gate line WL1 and also between the source line sideselect gate line SGS1 and adjacent control gate line WL32, so that thespace can be reduced to the same value of the space between controlgates.

With the above-discuss d manufacturing method, it is possible toindependently form the select transistor and memory cell transistor in aself-aligning manner so as to have different channel impurity densities.

In this manner, respective transistors are formed in a self-alignedmanner whereby impurity density at a portion of the channel section ofthe memory cell select transistor and the impurity density in thechannel portion of the memory cell section are different. In this case,in the select transistor, a portion of the ions passing through, whenperforming channel ion implantation, remain in the gate insulating layer13 below the charge storage layer 14. That residual ion regionconfigures a peripheral region including that immediately below theshape of the opening 22 formed in the inter-gate insulating layer 15 onthe charge storage layer 14.

With the modified example 1 of the first embodiment, it is not necessaryto perform channel implantation via the gate insulating layer 13 of thememory cell transistor and in particular, there is no degradation in thecharacteristics of the nonvolatile semiconductor memory device with aconfiguration having a floating gate.

It should be noted that the modified example 1 of the first embodimentis equally applicable to n channel transistors and p channeltransistors, and furthermore, either boron (B) or phosphorus (P) may beused as the impurity ion species to be ion implanted for channel controlin the memory cell transistor and select transistor.

In this manner, in the modified example of the first embodiment, thememory cell transistor is masked, highly accurate openings 34 in themask material 32 corresponding to the select transistor channel regionare formed, ion implantation is performed in the channel region usingthe openings 34, and channel ion implantation is performed withoutmisalignment.

In addition, since, in the memory cell transistor, ion implantation isperformed on the select transistor when there are no openings in theinter-gate insulating layer 15 between the first conductive layer 14 andthe second conductive layer 16 of the gate electrode, the density of thememory cell transistor channel region is independent of selecttransistor channel density.

Modified Example 2 of the First Embodiment

With the configuration of a nonvolatile semiconductor memory device ofthis modified example 2, the configuration of the nonvolatilesemiconductor memory device shown in FIG. 12 is modified as shown inFIG. 24. Accordingly, it is possible to improve the cut-offcharacteristics by forming a highly doped channel ion implantationregion 25 in the semiconductor substrate 10 corresponding to the opening22 in the inter-gate insulating layer 15 of the select gate of the pairof two select gates that is formed farther away from the memory cellgate. In this case, a channel ion implantation region 12 identical tothat of the memory cell gate is formed below the select gate adjacent tothe memory cell gate.

Although a select gate is formed on both the source side and drain sidein each NAND string 23, impurity density and depth into the channel ionimplantation region below the select gate adjacent to the memory cellgate may be set so as to be equal to the impurity density and depth intothe channel ion implantation region of the memory cell gate on both oreither one of the source side and drain side.

The manufacturing method of the modified example 2 of the firstembodiment, forms a highly doped ion implantation region 25 in thesemiconductor substrate 10 solely for the select gate 21 where ionimplantation is performed below the select gate 21 by coating theplanned select gate formation region, where ion implantation is notperformed under the select gate 21, with photo resist following the stepshown in FIG. 24 in the manufacturing method in the first embodiment.

In this manner, while adopting the gate structure shown in FIG. 12, itis possible to make the cut-off characteristics of the selecttransistors different by forming the density and depth of the channelion implantation region so as to be lower and shallower than the selecttransistor farther away from the memory cell transistor through channelion implantation by masking the side of the select transistor adjacentto the memory cell transistor with a resist (not shown in the figure).

In other words, the channel ion implantation region of the select gate21 adjacent to the memory cell transistor has the same density and depthas the density and depth of the channel ion implantation region of thememory cell gate 1. In contrast, the channel ion implantation region ofthe select gate 21 on the side away from the memory cell transistor isformed so that the density and depth are more highly doped and deeperthan the density and depth of the channel ion implantation region of thememory cell gate.

In this case, by improving the cut-off performance on the side fartherfrom the memory cell gate 1 higher than single gate-type devices, it ispossible to control the effect of impurity diffusion to be lower in theselect gate 21 formed on the side adjacent to the memory cell gate 1.Through such configuration, it is possible to prevent channel impuritydiffusion so as to the memory cell transistor adjacent the select gate21.

Modified Example 3 of the First Embodiment

In this modified example, the configuration of the nonvolatilesemiconductor memory device shown in FIG. 12 is modified as shown inFIG. 25. Accordingly, it is possible to improve the cut-offcharacteristics by forming a highly doped channel ion implantationregion 25 in the semiconductor substrate 10, which corresponds to theopening 22 in the inter-gate insulating layer 15 of one of the pairs oftwo select gates formed adjacent to the memory cell gate 1. In thiscase, the channel ion implantation region 12 is formed below the selectgate 21 apart from the memory cell gate 1 as with the memory cell gate1.

Although two select gates 21 are formed on the source side and drainside respectively in one NAND string, impurity density and depth in thechannel ion implantation region below the select gate 21 apart from thememory cell gate 1 may be set so as to be equal to the impurity densityand depth in the channel ion implantation region of the memory cell gate1 on both or either one of the source side and drain side.

The manufacturing method of the modified example 3 of the firstembodiment forms the highly doped ion implantation region 25 in thesemiconductor substrate only for the select gate where ion implantationis performed below the select gate by coating the planned select gateformation region, where ion implantation is not performed under theselect gate, with the photo resist after the steps shown in FIG. 19.

In this manner, while adopting the gate structure shown in FIG. 12, itis possible to make the cut-off characteristics of the selecttransistors different by forming the density and depth of the channelion implantation region so as to be lower and shallower than the selecttransistor apart from the memory cell transistor through channel ionimplantation, by masking the side of the select transistor adjacent tothe memory cell transistor with a resist (not shown in the figure).

In other words, the channel ion implantation region of the select gate21 apart from the memory cell gate 1 has the same density and depth asthe density and depth of the channel ion implantation region of thememory cell gate 1. In contrast, the channel ion implantation region ofthe select gate 21 on the side adjacent to the memory cell gate 1 isformed so that the density and depth are more highly doped and deeperthan the density and depth of the channel ion implantation region of thememory cell gate 1.

In this case, the cut-off performance on the side adjacent to the memorycell is improved.

It should be noted that each embodiment is applicable to a nonvolatilesemiconductor memory device having select gates. Each embodiment is alsoapplicable to transistors in peripheral circuits.

In addition, the invention is not limited to only a nonvolatilesemiconductor memory device, and each embodiment is applicable to amixed memory loading semiconductor device having a nonvolatilesemiconductor memory device.

Modified Example 4 of the First Embodiment

Instead of the steps in FIG. 18 through FIG. 20, as shown in FIG. 26through FIG. 28, it is possible to form a wide select transistor channeldiffused layer 25 by setting the opening 34 to be wider, and performingion implantation to the planned channel region of the select transistor.The steps of FIG. 26 through FIG. 28 have fabrication margins of greateraccuracy in microscopic fabrication in comparison with the steps shownin FIG. 18 through FIG. 20.

In other words, as shown in FIG. 26, by patterning a part of a plannedchannel region of a select transistor of the memory cell unit byutilizing a lithography process, an opening 34 is formed afterdepositing photo resist 33 on the mask materials 32. Here, a state whereone wide opening 34 is formed is shown.

Next, as shown in FIG. 27, the mask materials 32 immediately below theopening 34 of the photo resist 33 are etched and exposed.

A method capable of fabricating the minimum fabrication size in eachgeneration in the semiconductor manufacturing technology is used whenthe mask materials are patterned (that is, generally, amicro-fabrication technology with the highest performance is used).Accordingly, misalignment of the opening formed on the mask material maybe kept to a minimum.

Next, as shown in FIG. 28, the photo resist 33 is removed, ionimplantation is performed in the semiconductor substrate 10 which isused as the channel region of the select transistor via the inter-gateinsulating layer 15, floating electrode gate 14, and gate insulatinglayer 13, to form the select transistor channel diffused lay r 25. Boron(B) is typically used as the ion implantation species in this case.However, phosphorus (P) may be used in the case of surface-channel typep channel MOS.

In this case, mask material 32 is in the memory cell transistor region,and layer thickness configuration is determined so that ion-implantedionic species are attenuated in the mask material 32. The accelerationenergy of the ion implantation is adjusted so as to penetrate to thesemiconductor substrate 10, having passed through the charge storagelayer 14.

In this case, ion implantation is performed without the photo resists 33remaining, however, it is possible to perform ion implantation while thephoto resists 33 still remain, and remove the photo resists 33thereafter.

With the first embodiment and the modified example 1 to 4 of the presentinvention, it is possible to provide a minute nonvolatile semiconductormemory device and manufacturing method thereof wherein the cut-offcharacteristics of the transistor are improved.

Modified Example 5 of the First Embodiment

As the nonvolatile semiconductor memory device according to the modifiedexample 5 of the first embodiment of the present invention, theschematic circuit configuration of a 64M-bit NAND flash memory has, asshown in FIG. 29, two select gate lines SSL1 and SSL2 on the bit lineside of the NAND string, and two select gate lines GSL1 and GSL2 on thesource side. In FIG. 29, block 0 through block 1023 which are configuredwith NAND memory cell arrays are arranged, and a top page buffer 290,bottom page buffer 291, left row decoder/charge pump 292, and right rowdecoder/charge pump 293 are arranged surrounding the NAND memory cellarrays. In addition, in FIG. 29, word lines WL0, WL1, . . . , WL14, WL15are arranged in parallel with the select gate lines SSL1, SSL2, GSL1,and GSL2, and bit lines BL0, BL1, . . . , BL4223 are arrangedperpendicular to such word lines.

Modified Example 6 of the First Embodiment

As the nonvolatile semiconductor memory device according to the modifiedexample 6 of the first embodiment of the present invention, theschematic circuit configuration of the AND flash memory has, as shown inFIG. 30, two select gate lines SGS1 and SGS2 on the source side of theAND memory cell array, respectively, and two select gate lines SGD1 andSGD2 on the bit line side, respectively. In FIG. 30, a bottom pagebuffer 302, word line driver 300, and select gate control circuit 301are arranged surrounding the AND memory cell array. In addition, in theAND memory cell array, word lines WL0, WL1, . . . , WL15 are arrangedperpendicular to the bit lines BL0, BL1, BL4223, and memory cells areconnected to each word line. In FIG. 30, the region 303 enclosed by adotted line indicates the AND memory cell unit.

The name “AND” is derived from the fact that the connecting method is aparallel connection as with the NOR type, and logical method is oppositethe NOR type. The AND flash memory unit 303 is configured with 128 unitcells and two select gate lines SGD1, SGD2 which connect sub bit linesSUD to the bit lines BL0, BL1, . . . , BL4223 and two select gate linesSGS1, SGS2 which connect sub source lines SUS to common source line SLin the case of 64M-bit AND flash memory, for example, which is insertedbetween the sub bit line SUD and sub source line SUS in parallel. Thefeatures of this memory cell array is that a pseudo contactlessconfiguration is employed where the bit line BL0, BL1, . . . , BL4223and source line CS interconnections are configured to have ahierarchical structure and the sub bit line SUD and the sub source lineSUS are made of diffused layers.

FIG. 31A is a schematic cross-sectional configuration for describing awrite operation in the AND memory cell. FIG. 31B is a schematiccross-sectional configuration for describing an erase operation. In FIG.31A, upon a write operation, a source terminal 105 connected to a sourceregion 101 is left opened, and 3V is applied to a drain terminal 106connected to the drain region 102, −9V to a control gate terminal 107connected to the control gate 104, and 0V to a back bias terminal 108connected to the substrate 100. Upon a write operation, the drain region102 is subjected to tunneling injection of electrons from the floatinggate 103. In FIG. 31B, upon an erase operation, 0V is applied to thesource terminal 105, 0V to drain terminal 106, +13V to the control gateterminal 107 connected to the control gate 104, and 0V to the back biasterminal 108 connected to the substrate 100. Upon an erase operation,electrons are injected into the floating gate 103 from the substrate100. Writing/erasing of the memory cell is performed using aFowler-Nordheim (FN) tunneling current. As shown in FIG. 31A, writingoperation to the memory cell is performed by injecting electrons fromthe floating gate 13 to the drain region 102 side using the tunnelingcurrent. In the erase operation, as shown in FIG. 38B, electrons areinjected from the substrate 100 to the floating gate 13 using the FNtunneling current of the entire channel surface.

Modified Example 7 of the First Embodiment

The divided bit line NOR (DINOR) type flash memory has the followingfeatures: single power supply operation, high-speed writing, and smallmemory size, which are features of the NAND flash memory, and high-speedrandom access, which is a feature of the NOR flash memory. Hierarchicalconfiguration is employed for the bit line and sub bit lines SUD in thememory array, therefore, the DINOR flash memory unit is approximatelyequal to that of the AND type. The memory cell is a stack gate type aswith the NOR type or NAND type, and the drain in the memory cell isconnected in parallel to the sub bit line SUD which is made ofpolysilicon. For example, in the case of a 16M-bit DINOR type flashmemory, 64 memory cells are connected to the sub bit line SUD. Reductionof the memory cell size is implemented by making the connection to thememory cell by using implanted contacts between the polysilicon anddiffused layer. The write/erase mechanism to the memory cell is the sameas that of the AND flash memory, and is performed using theFowler-Nordheim (FN) tunneling current. Writing to the memory cell isperformed by injecting electrons from the floating gate to the drainregion side using tunneling current. In the erase operation, electronsare injected from the substrate to the floating gate using the FNtunneling current of the entire channel surface.

As in the nonvolatile semiconductor memory device according to themodified example 7 of the first embodiment of the present invention, theschematic circuit configuration of the divided bit line NOR flash memoryhas, as shown in FIG. 32, the bit lines BL0, BL1, . . . , BL2047 and thesub bit line SUD are configured to have a hierarchical structure in theDINOR memory cell array, two select gate lines SGL11 and SGL12 on thesource side, and two select gate lines SGL01 and SGL02 on the bit lineside both for connecting between the bit lines and the sub bit linesSUD. In FIG. 32, a bottom page buffer 312, word line driver 310, andselect gate control circuit 311 are arranged surrounding the DINORmemory cell array. In addition, in the DINOR memory cell array, wordlines WL0 through WL63 are arranged perpendicular to the bit lines BL0through BL2047, with a memory cell row connected to each word line. InFIG. 31, an area 313 enclosed by a dotted line indicates the DINORmemory cell unit. In addition, a closed circle “●” indicates a diffusedlayer region, and an open circle “◯” indicates a contact region.

Second Embodiment

In the second embodiment of the present invention, isolatingcharacteristics between the memory cell gate and bit line or source lineare improved by dividing the select gate in two. Unlike the firstembodiment of the present invention, the select gates short circuit at apredetermined pitch, and a technique is employed to reduce the delay ofsignals propagated on the select gate line by applying the same electricpotential.

FIG. 33 illustrates the memory cell array configured by arranging theNAND flash memory cell units of the present invention. Two select gatelines SGD1 and SGD2 of the bit line side select transistor and twoselect gate lines SGS1 and SGS2 of the source line side selecttransistor are each short circuited every 64 bit lines, and configurethe select gate line SGD of the bit line side select transistor andselect gate SGS of the source line side select transistor. The presentinvention is also applicable to the case where occurrence ofshort-circuiting can be varied.

Modified Example 1 of the Second Embodiment

FIG. 34 illustrates an example where the gate length of only the selectgate line SGD2 of the second bit line side select transistor is given asW2, and gate lengths of the select gate line SGD1 of the first bit lineside select transistor, select gate line SGS1 of the first source lineside select transistor, and select gate line SGS2 of the second sourceline side select transistor, and gate lengths of control gates (wordlines) WL1 through WL32 of each memory cell gate 1 are given as W1,wherein W2 is made larger than W1.

In FIG. 34, two select gate lines SGD1 and SGD2 of the bit line sideselect transistor and two select gate lines SGS1 and SGS2 of the sourceline side select transistor are each short circuited every 64 bit lines,and configure the select gate line SGD of the bit line side selecttransistor and select gate SGS of the source line side selecttransistor. The modified example 1 of the present invention is alsoapplicable to the case where occurrence of short-circuiting can bevaried.

Modified Example 2 of the Second Embodiment

FIG. 35 illustrates an example where the gate length of only the selectgate line SGS2 of the second source line side select transistor is givenas W2, and gate lengths of the select gate line SGS1 of the first sourceline side select transistor, select gate line SGD1 of the first bit lineside select transistor, and select gate line SGD2 of the second bit lineside select transistor, and gate lengths of control gates (word lines)WL1 through WL32 of each memory cell gate 1 are given as W1, wherein W2is made larger than W1.

In FIG. 35, two select gate lines SGD1 and SGD2 of the bit line sideselect transistor and two select gate lines SGS1 and SGS2 of the sourceline side select transistor are each short circuited every 64 bit lines,and configure the select gate line SGD of the bit line side selecttransistor and select gate SGS of the source line side selecttransistor. The modified example 2 of the present invention is alsoapplicable to the case where occurrence of short-circuiting can bevaried.

Modified Example 3 of the Second Embodiment

FIG. 36 illustrates an example where the gate lengths of only the selectgate line SGD2 of the second bit line side select transistor and selectgate line SGS2 of the second source line side select transistor aregiven as W2, and gate lengths of the select gate line SGD1 of the firstbit line side select transistor and select gate line SGS1 of the firstsource line side select transistor, and gate lengths of control gates(word lines) WL1 through WL32 of each memory cell gate 1 are given asW1, wherein W2 is made larger than W1.

In FIG. 36, two select gate lines SGD1 and SGD2 of the bit line sideselect transistor and two select gate lines SGS1 and SGS2 of the sourceline side select transistor are each short circuited every 64 bit lines,and configure the select gate line SGD of the bit line side selecttransistor and select gate SGS of the source line side selecttransistor. The modified example 3 of the present invention is alsoapplicable to the case where occurrence of short-circuiting can bevaried.

Modified Example 4 of the Second Embodiment

FIG. 37 illustrates an example where the select gate lines of the bitline side select transistor are divided into two given as SGD1 and SGD2,and the select gate lines of the source line side select register arearranged into one, given as SGS. An example is shown where the gatelength of only the source side select gate line SGS is given as W3, andthe gate lengths of the select gate lines SGD1 and SGD2 of the bit lineside select transistor and control gate (word lines) WL1 through WL32 ofeach memory cell gate 1 are given as W1, wherein W3 is made larger thanW1. The distance separating the select gate line SGS of the source lineside select transistor and the neighboring memory cell gate 1 j is givenas X F, wherein X F is larger than F.

In FIG. 37, two select gate lines SGD1 and SGD2 of the bit line sideselect transistor are short circuited every 64 bit lines, and configurethe select gate line SGD of the bit line side select transistor. Themodified example 4 of the present invention is also applicable to thecase where occurrence of short-circuiting can be varied.

Modified Example 5 of the Second Embodiment

FIG. 38 illustrates an example where the select gate lines of the sourceline side select transistor are divided into two given as SGS1 and SGS2,and the select gate lines of the bit line side select register arearranged into one, given as SGD. An example is shown where the gatelength of only the select gate line SGD of the bit line side selecttransistor is given as W3, and the gate lengths of the select gate linesSGS1 and SGS2 of the source line side select transistor and controlgates (word lines) WL1 through WL32 of each memory cell gate 1 j aregiven as W1, wherein W3 is made larger than W1. The distance separatingthe select gate line SGD of the bit line side select transistor andneighboring memory cell gate 1 j is given as X F, wherein X F is largerthan F.

In FIG. 38, two select gate lines SGS1 and SGS2 of the source line sideselect transistor are short circuited every 64 bit lines, and configurethe select gate line SGS of the source line side select transistor. Themodified example 5 of the present invention is also applicable to thecase where occurrence of short-circuiting can be varied.

Modified Example 6 of the Second Embodiment

FIG. 39 is an illustrative circuit diagram of the nonvolatilesemiconductor memory device configured with an AND flash memoryaccording to the modified example 6 of the second embodiment of thepresent invention. An example is shown where the present invention isapplied to the AND memory cell unit. The two bit line side select gateline ST11 and ST12, and two source line side select gate line ST21 andST22 are short circuited every arbitrary bit line, and configure one bitline side select gate line ST1 and one source line side select gate lineST2, respectively. Word lines WL1, WL2 through WLm are arrangedperpendicular to the bit lines BL1, BL2 through BLn. In FIG. 39, theregion 303 enclosed by a dotted line indicates the AND memory cell unit.The source line CS is configured to have a electrically commonpotential. The AND flash memory unit 303 is configured with 128 unitcells and two select gate lines ST11, ST12 which connect sub bit linesSUD to the bit lines BL1, BL2, . . . , BLn and two select gate linesST21, ST22 which connect sub source lines SUS to common source line CSin the case of an AND flash memory. For example, the 128 unit memorycells are inserted between the sub bit line SUD and sub source line SUSin parallel. Features of this memory cell array include a pseudocontactless configuration employed where the bit line BL1. BL2, . . . ,BLn and source line CS interconnections are configured to have ahierarchical structure and the sub bit line SUD and the sub source lineSUS are diffused layers.

Modified Example 7 of the Second Embodiment

As in the modified example 7 of the second embodiment of the presentinvention, the schematic circuit configuration of the divided bit lineNOR flash memory includes components as shown in FIG. 40. Specifically,the bit lines BL0, BL1, . . . , BL2047 and the sub bit line SUDconfigured to have a hierarchical structure in the DINOR memory cellarray, two select gate lines SGL11 and SGL12 on the bottom page side,and two select gate lines SGL01 and SGL02 on the top page side both forconnecting between the bit lines and the sub bit lines SUD. The top pageside two select gate lines SGL01 and SGL02, and bottom page two sideselect gate line SGL11 and SGL12 are short circuited every arbitrary bitline, and configure one select gate line SGL0 and one select gate lineSGL1, respectively. In addition, in the DINOR memory cell array, wordlines WL0 through WL63 are arranged perpendicular to the bit lines BL0through BL2047, with a memory cell row connected to each word line. Thesource region of each memory cell is connected to a common source lineSL so as to provide a common electric potential. In FIG. 40, an area 313enclosed by a dotted line indicates the DINOR memory cell unit. Inaddition, a closed circle “●” indicates a diffused layer region, and anopen circle “◯” indicates a contact region.

Modified Example 8 of the Second Embodiment

As the nonvolatile semiconductor memory device according to the modifiedexample 8 of the second embodiment of the present invention, theillustrative circuit configuration of the 64M-bit NAND flash memory has,as shown in FIG. 41, two select gates SSL1 and SSL2 on bit line side ofthe NAND string, and two select gates GSL1 and GSL2 on the source side.In FIG. 41, block 0 through block 1023 which are configured with an NANDmemory cell array are arranged, with a top page buffer 290, bottom pagebuffer 291, left row decoder/charge pump 292, and right rowdecoder/charge pump 293. In addition, in FIG. 41, word lines WL0 throughWL 15 are arranged parallel to the lines of select gate lines SSL1,SSL2, GSL1, and GSL2, and bit lines BL0, BL1, through BL4223 arearranged perpendicular to such word lines. The features of FIG. 41 arethe fact that the select gate lines SSL1 and SSL2 are short circuited,and select gate lines GSL1 and GSL2 are short circuited.

With the modified example 8 of the second embodiment of the presentinvention, it is possible to provide a system and a semiconductor memorydevice that aims to improve reliability by preventing a breakdown of theresist and fluctuation in the processing of the gate length of thecontrol gate due to breaks in the regularity of the pattern during gateprocessing. This improvement is achieved through the dividing of theselect gate of the select transistor into a first transistor and secondtransistor, and synchronizing at least the gate length of the firstselect transistor near the control gate (in the word line) and the spacebetween gates with the pitch of the gate length of the control gate andthe space between the gates.

By dividing the select transistors, there is no need for the spacebetween the select transistor and neighboring control gate and the gatelength of the select transistor for improving the punch-through immunityto be longer than that of the control gate. As a result, it is possibleto minimize chip size, and to achieve cost reductions in addition toprocess and reliability improvements. As the design rule is miniaturizedfurther, the effect of the present invention is more pronounced.

Accordingly, with the modified example 8 of the second embodiment of thepresent invention, it is possible to provide a highly reliable, and lowcost semiconductor memory device.

Third Embodiment

In the third embodiment of the present invention, isolatingcharacteristics between the memory cell gate and bit line DQ or sourceline CS are improved by dividing the select gate in three. As with thefirst embodiment of the present invention, different signal potentialsmay be supplied to the select gates. Alternatively, as with the secondembodiment of the present invention, the select gates short circuit at apredetermined pitch, and a technique is employed to reduce the delay ofsignals propagated on the select gate line.

FIG. 42 is a planar view of an example of a nonvolatile semiconductormemory device, configured with the NAND flash memory according to athird embodiment of the present invention. The memory cell array isconfigured by arranging the NAND flash memory cell units of the presentinvention in an array is illustrated. Three gate lines SGD1, SGD2, andSGD3 of the bit line side select transistor and three gate lines SGS1,SGS2, and SGS3 of the source line side select transistor are shortcircuited every 64 bit lines respectively, and configure the gate lineSGD of the bit line side select transistor and select gate SGS of thesource line side select transistor. The third embodiment of the presentinvention is also applicable to the case where occurrence ofshort-circuiting can be varied.

FIG. 42 illustrates an example where the gate length of only the gateline SGB3 of the third bit line side select transistor is given as W2,and the gate lengths of the gate line SGD1 of the first bit line sideselect transistor, gate line SGD2 of the second bit line side selecttransistor, gate line SGS1 of the first source line side selecttransistor, gate line SGS2 of the second source line side selecttransistor, gate line SGS3 of the third source line side selecttransistor, and gate lengths of control gates (word lines) WL1 throughWL32 are given as W1, wherein W2 is made larger than W1. In addition,three bit line side select gate lines SGD1. SGD2, SGD3 may be isolatedelectrically and three different signal potentials can be applied tothem, respectively. In the same way, three source line side select gatelines SGS1, SGS2, SGS3 may be isolated electrically and three differentsignal potentials can be applied to them, respectively.

FIG. 43 is a planar view describing a pattern configuration which isconfigured by extending the planar view shown in FIG. 42 along adirection of the NAND strings 5 j, 5 j+1, . . . and repeating thepattern of the NAND strings 5 j, 5 j+1, . . . along the bit line. Afirst memory cell gate group 11 a includes first select gate groups 21a, 21 b, and 21 c adjacent to the drain side, and second select gategroups 22 a, 22 b,a and 22 c adjacent to the source side. A secondmemory cell gate group 12 b includes third select gate groups 23 a, 23b, and 23 c adjacent to the source side, and fourth select gate groups24 a, 24 b, and 24 c adjacent to the drain side. In this manner, theNAND strings 5 j are arranged with a repeat pattern configurationcentered about the drain side bit line DQ or the source side source lineCS. Three select gate lines SGD1, SGD2, and SGD3 of the bit line sideselect transistor are short circuited, however, this description isomitted. In addition, three select gate lines SGS1, SGS2, and SGS3 ofthe source line side select transistor are short circuited, however,this description is omitted. Alternatively, as described above, threedifferent signal potentials can be applied for three bit line sideselect gate lines SGD1, SGD2 and SGD3, respectively. In the same way,three different signal potentials can be applied for three source lineside select gate lines SGS1, SGS2 and SGS3, respectively.

Modified Example 1 of the Third Embodiment

FIG. 44 is a planar view of an example of a nonvolatile semiconductormemory device, configured with the NAND flash memory according to themodified example 1 of the third embodiment of the present invention.

In FIG. 44, three select gate lines SGD1, SGD2 and SGD3 of the bit lineside select transistors and three select gate lines SGS1, SGS2 and SGS3of the source line side select transistors are each short circuitedevery 64 bit lines, and configure the select gate line SGD of the bitline side select transistor and select gate SGS of the source line sideselect transistor. The modified example 1 of the present invention isalso applicable to the case where occurrence of short-circuiting can bevaried.

FIG. 44 illustrates an example where the gate length of only the selectgate line SGS3 of the third source side select transistor is given asW2, and the gate lengths of the gate line SGS1 of the first source lineside select transistor, gate line SGS2 of the second source line sideselect transistor, gate line SGD1 of the first bit line side selecttransistor, gate line SGD2 of the second bit line side selecttransistor, and gate line SGD3 of the third bit line side selecttransistor, and gate lengths of control gates (word lines) WL1 throughWL32 are given as W1, wherein W2 is made larger than W1.

Alternatively, as described above, three different signal potentials canbe applied for three bit line side select gate lines SGD1, SGD2 andSGD3, respectively. In the same way, three different signal potentialscan be applied for three source line side select gate lines SGS1, SGS2and SGS3, respectively.

Modified Example 2 of the Third Embodiment

FIG. 45 is a planar view of an example of the nonvolatile semiconductormemory device configured with the NAND flash memory according to themodified example 3 of the third embodiment of the present invention.FIG. 45 illustrates an example where the gate lengths of only the gateline SGD3 of the third bit line side select transistor and the gate lineSGS3 of the third source line side select transistor are given as W2,and the gate lengths of the gate line SGD1 of the first bit line sideselect transistor, the gate line SGD2 of the second bit line side selecttransistor, gate line SGS1 of the first source line side selecttransistor, and gate line SGS2 of the second source line side selecttransistor, and the gate lengths of control gates (word lines) WL1through WL32 are given as W1, wherein W2 is made larger than W1.

In FIG. 45, three select gate lines SGD1, SGD2 and SGD3 of the bit lineside select transistors and three select gate lines SGS1, SGS2 and SGS3of the source line side select transistors are each short circuitedevery 64 bit lines, and configure the select gate line SGD of the bitline side select transistor and select gate SGS of the source line sideselect transistor. The modified example 2 of the present invention isalso applicable to the case where occurrence of short-circuiting can bevaried.

Alternatively, as described above, three different signal potentials canbe applied for three bit line side select gate lines SGD1 SGD2 and SGD3,respectively. In the same way, three different signal potentials can beapplied for three source line side select gate lines SGS1, SGS2 andSGS3, respectively.

Modified Example 3 of the Third Embodiment

FIG. 46 is a planar view of an example of the nonvolatile semiconductormemory device configured with the NAND flash memory according to themodified example 3 of the third embodiment of the present invention.FIG. 46 illustrates an example where the select gate line of the bitline side select transistor is divided into three given as SGD1, SGD2,and SGD3, and the select gate line of the source line side selecttransistor are arranged as one, given as SGS. An example is shown wherethe gate length of only the source side select gate line SGS is given asW3, and the gate lengths of the select gate lines SGD1, SGD2, and SGD3of the bit line side select transistor and control gates (word lines)WL1, WL2 through WL32 of each memory cell gate 1 j are given as W1,wherein W3 is made larger than W1. The distance separating the selectgate line SGS of the source line side select transistor and theneighboring memory cell gate 1 j is given as X F, wherein X F is largerthan F.

In FIG. 46, three select gate lines SGD1, SGD2 and SGD3 of the bit lineside select transistors are short circuited every 64 bit lines, andconfigure the select gate line SGD of the bit line side selecttransistor. The modified example 3 of the present invention is alsoapplicable to the case where occurrence of short-circuiting can bevaried.

Modified Example 4 of the Third Embodiment

FIG. 47 is a planar view of an example of the nonvolatile semiconductormemory device configured with the NAND flash memory according to thethird embodiment of the present invention. FIG. 47 illustrates anexample where the select gate line of the source line side selecttransistor is divided into three given as SGS1, SGS2, and SGS3, and theselect gate line of the bit line side select register are arranged asone, given as SGS. An example is shown where the gate length only of theselect gate line SGD of the bit line side select transistor is given asW3, and the gate lengths of the select gate lines SGS1, SGS2, and SGS3of the source line side select transistor and control gates (word lines)WL1, WL2 through WL32 of each memory cell gate 1 are given as W1,wherein W3 is made larger than W1. The distance separating the selectgate line SGD of the bit line side select transistor and neighboringmemory cell gate 1 j is given as X F, wherein X F is larger than F.

In FIG. 47, three select gate lines SGS1, SGS2 and SGS3 of the sourceline side select transistors are short circuited every 64 bit lines, andconfigure the select gate line SGS of the source line side selecttransistor. The modified example 4 of the present invention is alsoapplicable to the case where occurrence of short-circuiting can bevaried.

Alternatively, as described above, three different signal potentials canbe applied for three source line side select gate lines SGS1, SGS2 andSGS3, respectively.

Modified Example 5 of the Third Embodiment

FIG. 48 is a circuit diagram of an example of the nonvolatilesemiconductor memory device configured with the AND flash memoryaccording to the modified example 5 of the third embodiment of thepresent invention. As shown in FIG. 48, the bit line select gate isdivided in three, ST11, ST12, and ST13. In addition, the source lineside select gate is divided into three, ST21, ST22, and ST23. As withthe first embodiment of the present invention, different signals may besupplied to these gates from the control circuit. Alternatively, as withthe second embodiment of the present invention, the select gates may beshort circuited at a predetermined pitch, and a technique employed toreduce the delay of signals propagated on the select gate line.

In FIG. 48, word lines WL1, WL2 through WLm are arranged perpendicularto the bit lines BL1, BL2 through BLn. The region 303 enclosed by adotted line indicates the AND memory cell unit. The source line CS isconfigured to have a common electrical potential. The AND flash memoryunit 303 is configured with 128 unit cells and three select gate linesST11, ST12 and ST13 which connect sub bit lines SUD to the bit linesBL1, BL2, . . . , BLn and three select gate lines ST21, ST22 and ST23which connect sub source lines SUS to common source line CS, forexample, which is inserted between the sub bit line SUD and sub sourceline SUS in parallel. The features of this memory cell array is that apseudo contactless configuration is employed where the bit line BL1,BL2, . . . , BLn and source line CS interconnections are configured tohave a hierarchical structure and the sub bit line SUD and the subsource line SUS are made of diffused layers.

Modified Example 6 of the Third Embodiment

FIG. 49 is an illustrative circuit diagram of the nonvolatilesemiconductor memory device configured with divided bit line NOR flashmemory according to the modified example 6 of the third embodiment ofthe present invention. As shown in FIG. 49, the schematic circuitconfiguration of the divided bit line NOR flash memory has the bit linesBL0, BL1, . . . , BL2047 and the sub bit line SUD configured to have ahierarchical structure in the DINOR memory cell array, three select gatelines SGL11, SGL12 and SGL13 on the bottom page side, and three selectgate lines SGL01, SGL02 and SGL03 on the top page side both forconnecting between the bit lines and the sub bit lines SUD. As shown inFIG. 49, the top page side select gate is divided in three, SGL01,SGL02, and SGL03. In addition, the bottom page side select gate isdivided into three, SGL11, SGL12, and SGL13. As with the firstembodiment of the present invention, different signals may be suppliedto these gates from the select gate control circuit 301 as shown in FIG.30. Alternatively, as with the second embodiment of the presentinvention, the select gates short circuit at a predetermined pitch, anda technique is employed to reduce the delay of signals propagated on theselect gate line.

In addition, in the DINOR memory cell array, word lines WL0 through WL63are arranged perpendicular to the bit lines BL0 through BL2047, with amemory cell row connected to each word line. The source region of eachmemory cell is connected to a common source line SL so as to provide acommon electric potential. In FIG. 49, an area 313 enclosed by a dottedline indicates the DINOR memory cell unit. In addition, a closed circle“●” indicates a diffused layer region, and an open circle “◯” indicatesa contact region.

Modified Example 7 of the Third Embodiment

FIG. 50 is an illustrative circuit diagram of the nonvolatilesemiconductor memory device configured with the 64-M bit NAND flashmemory according to the modified example 7 of the third embodiment ofthe present invention; As shown in FIG. 50, the bit line side selectgate line is divided in three, SSL1, SSL2, and SSL3. In addition, thesource line side select gate line is divided in three, GSL1, GSL2, andGSL3. As with the first embodiment of the present invention, differentsignals may be supplied to the above gates from the control circuit. Or,as with the second embodiment of the present invention, the select gatesmay be short circuited at a predetermined pitch, and a techniqueemployed to reduce the delay of signals propagated on the select gateline. In the exemplary circuit configuration of FIG. 50, a technique isemployed to supply the same electric potential through the operation ofthe row select transistor. In FIG. 50, block 0 through block 1023configured with NAND memory cell arrays are arranged, and a top pagebuffer 290, bottom page buffer 291, left row decoder/charge pump 292,and right row decoder/charge pump 293 are arranged surrounding the NANDmemory cell arrays. In addition, in FIG. 50, word lines WL0 through WL15 are arranged in parallel with the select gate lines SSL1, SSL2, SSL3,GSL1, GSL2, and GSL3, and bit lines BL0 through BL4223 are arrangedperpendicular to such word lines. A feature of FIG. 50 is that theselect gate lines SSL1, SSL2, and SSL3 are short circuited, and theselect gate lines GSL1, GSL2, and GSL3 are short circuited.

With the modified example 7 of the third embodiment of the presentinvention, it is possible to improve reliability by preventing abreakdown of the resist and fluctuation in the processing of the gatelength of the control gate due to breaks in the regularity of thepattern during gate processing by dividing the gate of the selecttransistor into first, second, and third select transistors, andsynchronizing at least the gate length of the first select transistornear the control gate (in the word line) and the space between the gateswith the pitch of the gate length of the control gate and the spacebetween the gates.

By dividing the select transistors, there is no need for the spacebetween the select transistor and neighboring control gate and the gatelength of the select transistor for improving the punch-through immunityto be longer than that of the control gate. As a result, it is possibleto minimize chip size, and to achieve cost reductions in addition toprocess and reliability improvements. As the design rule isminiaturized, the effect of the present invention is more pronounced.

Accordingly, with the modified example 7 of the third embodiment of thepresent invention, it is possible to provide a highly reliable, low costsemiconductor memory device.

Fourth Embodiment

Roughly classified, there are three operation modes of a nonvolatilesemiconductor memory device according to the embodiments of the presentinvention. These modes are termed “page mode”, “byte mode”, and “EEPROMmode having a ROM regions”.

The page mode performs, as shown in FIG. 51, a read operation isperformed for each stored memory, at once, of a memory cell row 606formed on the word line 604 in the flash memory cell array 601 into thesense amplifier 602 as a memory cell row 605 via the bit line 603, oralternatively a write operation from the sense amplifier 602 at once. Inother words, reading/writing operation is performed page-by-page. InFIG. 51, memory cells 607 are arranged on the intersections of the wordline 604 and bit line 603.

In contrast, the byte mode performs, as shown in FIG. 52, read operationof the memory cell 608 formed on the word lines 604 in the flash memorycell array 601 is performed to the sense amplifier 602 as the memorycell 613 byte-by-byte, or a write operation from the memory cell 613 inthe sense amplifier 602 in the memory cell 608 is performedbyte-by-byte. In other words, it is different from the page mode in thatreading/writing is performed byte-by-byte.

In the EEPROM mode having a ROM region, as shown in FIG. 53, operationsof reading information from the flash memory cell array 601page-by-page, or, byte-by-byte, and rewriting the information bydividing the inside of the flash memory cell array 601 into a flashmemory 609 section and the EEPROM 610 section are performed. Thensystematically switching the EEPROM 610 section having a flash memory609 is performed so that the EEPROM 610 conducts rewriting operations.An example where the memory cell row 611 on the same word line in theflash memory 609 are read out or written in the EEPROM 610 side as thememory cell row 612 is shown in FIG. 53.

FIG. 54 is an illustrative circuit diagram of the EEPROM mode flashmemory shown in FIG. 53 that is used in the nonvolatile semiconductormemory device according to the fourth embodiment of the presentinvention. An exemplary circuit shown in FIG. 54 features the use of athree-transistor NAND cell configuration. In other words, a threetransistor/cell style NAND memory cell array is configured by arrangingtwo switching transistors for each NAND memory cell. CGL is the controlgate line, SSL is the gate line for the source side switchingtransistor, and GSL is the gate line for the drain side switchingtransistor. One horizontal block of NAND memory cells on the same CGLline configure one page. Bit lines BL0, BL1, B2, BL3 through BL1022, andBL1023 are arranged vertically. By using three such transistor/cellstyle NAND memory cells, it is possible to implement the EEPROM modeflash memory cell array 601 as shown in FIG. 53.

Naturally, it is possible to operate the respective nonvolatilesemiconductor memory devices according to the first through thirdembodiments of the present invention in each mode: page mode, byte mode,and EEPROM mode having a ROM region. In addition, in the above-mentionednonvolatile semiconductor memory device according to the first throughthird embodiments of the present invention, examples of NAND flashmemory, AND flash memory, and divided bit line (DI) NOR flash memory aredescribed, however, it is apparent that it is possible to implementoperation modes of page mode, byte mode, and EEPROM mode having a ROMregion in any of such three types of flash memory. In particular, asdescribed later, in the case of using the flash memory in applicationssuch as memory cards or IC cards, the EEPROM mode having a ROM regionallowing the flash memory to operate systematically is important forconfiguring system LSI as well as in terms of advancing one-chipintegration.

[System LSI]

In the nonvolatile semiconductor memory devices according to the firstthrough third embodiments of the present invention, various applicationexamples are possible. Some of those application examples are shown inFIG. 55 through FIG. 68.

Application Example 1

As an example, a memory card 60 including a semiconductor memory device50 is configured as shown in FIG. 58. The nonvolatile semiconductormemory device according to the first through third embodiments of thepresent invention are applicable to the semiconductor memory device 50.The memory card 60 is, as shown in FIG. 55, operable so as to receive apredetermined signal from an external device (not shown in the figure)or to transfer a predetermined signal to an external device (not shownin the figure).

A signal line DAT, a command line enable signal line CLE, an addressline enable signal line ALE, and a ready/busy signal line R/B areconnected to the memory card 60 in which the semiconductor memory device50 is embedded. The signal line DAT is used to transfer a data signal,an address signal, or a command signal. The command line enable signalline CLE is used to transmit a signal which indicates that the commandsignal is being transferred over the signal line DAT. The address lineenable signal line ALE is used to transmit a signal which indicates thatthe address signal is being transferred over the signal line DAT. Theready/busy signal line R/B is used to transmit a signal which indicateswhether or not the semiconductor memory device 50 is ready.

Application Example 2

Another example of the memory card 60 includes, as shown in FIG. 56, asemiconductor memory device 50, and a controller 76 that controls thesemiconductor memory device 50, and transfers a prescribed signal withan external device, unlike the example of the memory card of FIG. 55.The controller 76 has interface units 71 and 72, a microprocessor unit(MPU) 73, buffer RAM 74, and an error correction code unit (ECC) 75included in the interface unit (I/F) 72.

The interface unit (I/F) 71 transfers a prescribed signal to an externaldevice, and the interface unit (I/F) 72 transfers a prescribed signal tothe semiconductor memory device 50. The microprocessor unit (MPU) 73converts a logic address to a physical address. The buffer RAM 74temporarily stores data. The error correction code unit (ECC) 75generates an error correction code.

A command line CMD, clock signal line CLK, and signal line DAT areconnected to the memory card 60. The number of control signal lines, bitlength of signal line DAT, and circuit configuration of the controller76 may be modified as desired.

Application Example 3

Another exemplary configuration of the memory card 60 implements, asshown in FIG. 57, a system LSI chip 507 by integrating interface units(I/F) 71 and 72, a microprocessor unit (MPU) 73, buffer RAM 74, errorcorrection code unit (ECC) 75 included in the interface unit (I/F) 72,and semiconductor memory device region 501 all onto one chip. Such asystem LSI chip 507 is loaded in the memory card 60.

Application Example 4

Another exemplary configuration of the memory card 60 implements, asshown in FIG. 58, a mixed memory loading MPU 502, provided by formingthe semiconductor memory device region 501 in the microprocessor unit(MPU) 73, and implements a system LSI chip 506 by integrating interfaceunits (I/F) 71 and 72, a buffer RAM 74, and an error correction codeunit (ECC) 75 included in the interface unit (I/F) 72 all onto one chip.Such system LSI chip 506 is loaded in the memory card 60.

Application Example 5

Another exemplary configuration of the memory card 60 utilizes, as shownin FIG. 59, an EEPROM mode flash memory 503, configured with NAND flashmemories and byte EEPROM, instead of the semiconductor memory device 50shown in FIG. 55 or FIG. 56.

Naturally, it is possible to configure the system LSI chip 507 byforming the EEPROM mode flash memory 503 in the same chip as thecontroller 76, as shown in FIG. 57, and integrating them onto one chip.In addition, as shown in FIG. 58, naturally, it is possible to implementa mixed memory loading MPU 502 by forming a semiconductor memory regionconfigured with EEPROM mode flash memories 503 in the microprocessorunit (MPU) 73, and to configure a system LSI chip 506 by integrating theinterface units (I/F) 71 and 72 and buffer RAM 74 all onto one chip.

Application Example 6

As an application example of the memory card 60 shown in FIG. 56 throughFIG. 59, a memory card holder 80 may be proposed, as shown in FIG. 60.The memory card holder 80 may receive the memory card 60, which uses thenonvolatile semiconductor memory device described in detail in the firstthrough third embodiments of the present invention as a semiconductormemory device 50. The memory card holder 80 is connected to anelectronic device (not shown in the figure), and is operable as aninterface between the memory card 60 and the electronic device. Thememory card holder 80 is capable of executing various functionsincluding functions such as those of the controller 76, microprocessorunit (MPU) 73, buffer RAM 74, error correction code unit (ECC) 75, andinterface units (I/F) 71 and 72 in the memory card 60 disclosed in FIG.56 through FIG. 59.

Application Example 7

Another application example is described while referencing FIG. 61. InFIG. 61, a connecting apparatus 90 capable of receiving the memory card60 or memory card holder 80 is disclosed. A nonvolatile semiconductormemory device described in detail in the first through third embodimentsof the present invention is embedded in either the memory card 60 ormemory card holder 80 and 18 used as the semiconductor memory device 50,semiconductor memory device region 501, mixed memory loading MPU 502,and/or EEPROM mode flash memory 503.

The memory card 60 or memory card holder 80 is attached to theconnecting apparatus 90, and connected electrically. The connectingapparatus 90 is connected to a circuit board 91 which mounts a CPU 94and bus 95 via a connecting wire 92 and interface circuit 93.

Application Example 8

Another application example is described while referencing FIG. 62. Anonvolatile semiconductor memory device described in detail in the firstthrough third embodiments of the present invention is embedded in eitherthe memory card 60 or memory card holder 80 as the semiconductor memorydevice 50, semiconductor memory device region 501, mixed memory loadingMPU 502, and/or EEPROM mode flash memory 503. The memory card 60 ormemory card holder 80 is attached to the connecting apparatus 90, andconnected electrically. The connecting apparatus 90 is connected to apersonal computer (PC) 350 via a connecting wire 92.

Application Example 9

Another application example is described while referencing FIG. 63. Anonvolatile semiconductor memory device described in detail in the firstthrough third embodiments of the present invention is embedded in thememory card 60 with the semiconductor memory device 50, or semiconductormemory device region 501, mixed memory loading MPU 502, and EEPROM modeflash memory 503. FIG. 63 shows an example of applying such memory card60 to a digital camera 650 in which the memory card holder 80 isembedded.

Application Example 10

Another application example of the nonvolatile semiconductor memorydevice according to the first through third embodiment of the presentinvention configures, as shown in FIG. 64 and FIG. 65, an interfacecircuit (IC) card 500 which includes an MPU 400 configured with asemiconductor memory device 50, ROM 410, RAM 420, and CPU 430, and aplane terminal 600. The IC card 500 may be connected to an externaldevice via the plane terminal 600. In addition, the plane terminal 600is coupled to the MPU 400 of the IC card 500. The CPU 430 has acalculation section 431 and control section 432. The control section 432is coupled to the semiconductor memory device 50, ROM 410, and RAM 420.It is desirable that the MPU 400 be molded on one of the surfaces of theIC card 500, and the plane terminal 600 be manufactured on the othersurface of the IC card 500. As shown in FIG. 65, the nonvolatilesemiconductor memory device described in detail in the first throughthird embodiments of the present invention is applicable to thesemiconductor memory device 50 or ROM 410. In addition, it is possiblefor the nonvolatile semiconductor memory device to operate in page mode,byte mode, or EEPROM mode having a ROM region.

Application Example 11

Another exemplary configuration of the IC card 500 includes, as shown inFIG. 66, a system LSI chip 508 with ROM 410, RAM 420, a CPU 430, and asemiconductor memory device region 501 integrated onto one chip. Suchsystem LSI chip 508 is embedded in the IC card 500. As shown in FIG. 66,the nonvolatile semiconductor memory device described in detail in thefirst through third embodiments of the present invention is applicableto the semiconductor memory device region 501 and ROM 410. In addition,it is possible for the nonvolatile semiconductor memory device tooperate in page mode, byte mode, or pseudo EEPROM mode having a ROMregion.

Application Example 12

Another exemplary configuration of the IC card 500, as shown in FIG. 67,has an overall EEPROM mode flash memory 510 configuration with anembedded ROM 410 in the semiconductor memory device region 50, andconfigures a system LSI chip 509 by integrating the EEPROM mode flashmemory 510, RAM 420, and CPU 430 all onto one chip. Such system LSI chip509 is embedded in the IC card 500.

Application Example 13

Another exemplary configuration of the IC card 500, as shown in FIG. 68,has an overall EEPROM mode flash memory 510 configuration with anembedded ROM 410 in the semiconductor memory device 50 shown in FIG. 65.Such EEPROM flash memory 510 is embedded in the MPU 400 as with FIG. 65.

Other implementations are readily discernable to one of those skilled inthe art when the present description is read in view of the descriptionin U.S. Pat. No. 6,002,605, which is incorporated herein by reference inits entirely.

Other Embodiments

As described above, it is clear that the present invention includesvarious examples or the like which are not described herein.Accordingly, the technical scope of the present invention is determinedby the appended claims valid based on the above description.

Various modifications will become possible for those skilled in the artafter receiving the teachings of the present disclosure withoutdeparting from the scope thereof.

1. (canceled)
 2. A nonvolatile semiconductor memory embedded in a cardoperable so as to receive and transfer a predetermined signal from anexternal device, and the nonvolatile semiconductor memory comprising: aplurality of word lines disposed in a row direction; a plurality of bitlines disposed in a column direction perpendicular to the word lines;memory cell transistors having a source region, a drain region, a gateelectrode and a charge storage layer, provided in the column directionand an electronic storage condition of the memory cell transistorconfigured to be controlled by one of the plurality of the word linesconnected to the memory cell; a plurality of first select transistors,each including a gate electrode, selecting the memory cell transistorsprovided in the column direction, arranged in the column direction andadjacent to the memory cell transistors at a first end of the memorycell transistors; and a first select gate line connected to each of thegate electrodes of the first select transistors, wherein the pluralityof the word lines have a wiring line width which is the same as thefirst select gate line.
 3. The nonvolatile semiconductor memory of claim2, wherein a signal line DAT, a command line enable signal line CLE, anaddress line enable signal line ALE, and a ready/busy signal line R/Bare connected to the card.
 4. The nonvolatile semiconductor memory ofclaim 3, wherein the signal line DAT transfers a data signal, an addresssignal, or a command signal, the command line enable signal line CLEtransmits a signal which indicates that the command signal is beingtransferred over the signal line DAT, the address line enable signalline ALE transmits a signal which indicates that the address signal isbeing transferred over the signal line DAT, and the ready/busy signalline R/B transmits a signal which indicates whether or not thenonvolatile semiconductor memory is ready.
 5. The nonvolatilesemiconductor memory of claim 2, wherein the card further comprises acontroller.
 6. The nonvolatile semiconductor memory of claim 5, whereinthe controller controls the nonvolatile semiconductor memory andtransfers a prescribed signal with the external device.
 7. Thenonvolatile semiconductor memory of claim 5, wherein the controllercomprises an input and an output interface units (I/F), a microprocessorunit (MPU), and a buffer RAM.
 8. The nonvolatile semiconductor memory ofclaim 5, wherein the output interface unit comprises an error correctioncode unit (ECC).
 9. The nonvolatile semiconductor memory of claim 7,wherein the input interface unit transfers the prescribed signal to theexternal device, and the output interface unit transfers the prescribedsignal to the nonvolatile semiconductor memory, the microprocessor unit(MPU) converts a logic address to a physical address, the buffer RAMtemporarily stores data, and the error correction code unit (ECC)generates an error correction code.
 10. The nonvolatile semiconductormemory of claim 7, wherein a command line CMD, and a clock signal lineCLK are connected to the card.
 11. The nonvolatile semiconductor memoryof claim 7, wherein the card implements a system LSI chip by integratingthe input and output interface units (I/F), the microprocessor unit(MPU), the buffer RAM, the error correction code unit (ECC) included inthe output interface unit (I/F), and the nonvolatile semiconductormemory all onto one chip.
 12. A nonvolatile semiconductor memory formedin a mixed memory loading microprocessor unit (MPU) embedded in a card,and the nonvolatile semiconductor memory comprising: a plurality of wordlines disposed in a row direction; a plurality of bit lines disposed ina column direction perpendicular to the word lines; memory celltransistors having a source region, a drain region, a gate electrode anda charge storage layer, provided in the column direction and anelectronic storage condition of the memory cell transistor configured tobe controlled by one of the plurality of the word lines connected to thememory cell; a plurality of first select transistors, each including agate electrode, selecting the memory cell transistors provided in thecolumn direction, arranged in the column direction and adjacent to thememory cell transistors at a first end of the memory cell transistors;and a first select gate line connected to each of the gate electrodes ofthe first select transistors, wherein the plurality of the word lineshave a wiring line width which is the same as the first select gateline.
 13. The nonvolatile semiconductor memory of claim 12, wherein thecard implements a system LSI chip by integrating the input and outputinterface units (I/F), the mixed memory loading microprocessor unit(MPU), the buffer RAM, and the error correction code unit (ECC) includedin the output interface unit (I/F) all onto one chip.
 14. A nonvolatilesemiconductor memory formed in a microprocessor unit (MPU) embedded in acard comprising: a plurality of word lines disposed in a row direction;a plurality of bit lines disposed in a column direction perpendicular tothe word lines; memory cell transistors having a source region, a drainregion, a gate electrode and a charge storage layer, provided in thecolumn direction and an electronic storage condition of the memory celltransistor configured to be controlled by one of the plurality of theword lines connected to the memory cell; a plurality of first selecttransistors, each including a gate electrode, selecting the memory celltransistors provided in the column direction, arranged in the columndirection and adjacent to the memory cell transistors at a first end ofthe memory cell transistors; and a first select gate line connected toeach of the gate electrodes of the first select transistors, wherein theplurality of the word lines have a wiring line width which is the sameas the first select gate line.
 15. The nonvolatile semiconductor memoryof claim 14, wherein the microprocessor unit (MPU) further comprises, aROM, a RAM, and a CPU.
 16. The nonvolatile semiconductor memory of claim15, the card further comprises a plane terminal coupled to themicroprocessor unit (MPU).
 17. The nonvolatile semiconductor memory ofclaim 15, wherein the card is connected to an external device via theplane terminal.
 18. The nonvolatile semiconductor memory of claim 15,wherein the CPU comprises a calculation section and a control section.19. The nonvolatile semiconductor memory of claim 18, wherein thecontrol section is coupled to the nonvolatile semiconductor memory, theROM, and the RAM.
 20. The nonvolatile semiconductor memory of claim 15,wherein the card implements a system LSI chip by integrating the ROM,the RAM, the CPU, and the nonvolatile semiconductor memory all onto onechip.
 21. The nonvolatile semiconductor memory of claim 15, wherein theROM is coupled to the nonvolatile semiconductor memory to form anoverall EEPROM mode flash memory.